Emission studies of the gas‐phase oxidation of Mn during pulsed laser deposition of manganates in O2 and N2O atmospheres

1996 ◽  
Vol 80 (1) ◽  
pp. 513-517 ◽  
Author(s):  
P. Lecoeur ◽  
A. Gupta ◽  
P. R. Duncombe ◽  
G. Q. Gong ◽  
Gang Xiao
Keyword(s):  
Pulsed Laser Deposition ◽  
Gas Phase ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Phase Oxidation ◽  
Gas Phase Oxidation ◽  
Emission Studies

Field emission studies of nanostructured -axis oriented GaN film on SiOx /Si(100) by pulsed laser deposition

2007 ◽  
Vol 144 (7-8) ◽  
pp. 296-299 ◽  
Author(s):  
Suhas M. Jejurikar ◽  
P.M. Koinkar ◽  
M.A. More ◽  
D.S. Joag ◽  
K.P. Adhi ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Field Emission ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Emission Studies ◽  
Gan Film

Microanalysis of silicate glass films grown on α-Al2O3 by pulsed-laser deposition

1993 ◽  
Vol 51 ◽  
pp. 438-439
Author(s):  
Michael P. Mallamaci ◽  
James Bentley ◽  
C. Barry Carter
Keyword(s):  
Liquid Phase ◽  
Single Crystal ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ceramic Materials ◽  
Laser Deposition ◽  
Triple Junctions ◽  
Ion Milling ◽  
Multicomponent Oxides ◽  
Glass Films

Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of an anorthite-based (CaAl2Si2O8) glass on single-crystal α-Al2O3 was chosen as a model system to explore the feasibility of PLD for growing glass layers, since anorthite-based glass films are commonly found in the grain boundaries and triple junctions of liquid-phase sintered α-Al2O3 ceramics.Single-crystal (0001) α-Al2O3 substrates in pre-thinned form were used for film depositions. Prethinned substrates were prepared by polishing the side intended for deposition, then dimpling and polishing the opposite side, and finally ion-milling to perforation.

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