Plasma-oxidation of Ge(100) surfaces using dielectric barrier discharge investigated by metastable induced electron spectroscopy, ultraviolet photoelectron spectroscopy, and x-ray photoelectron spectroscopy

2011 ◽  
Vol 110 (3) ◽  
pp. 033302 ◽  
Author(s):  
L. Wegewitz ◽  
S. Dahle ◽  
O. Höfft ◽  
F. Voigts ◽  
W. Viöl ◽  
...  
Keyword(s):  
Dielectric Barrier Discharge ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Barrier Discharge ◽  
Ultraviolet Photoelectron Spectroscopy ◽  
Plasma Oxidation ◽  
Dielectric Barrier ◽  
X Ray

scholarly journals Hydrogen Production from Methane Cracking in Dielectric Barrier Discharge Catalytic Plasma Reactor Using a Nanocatalyst

Energies ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5921
Author(s):  
Asif Hussain Khoja ◽  
Abul Kalam Azad ◽  
Faisal Saleem ◽  
Bilal Alam Khan ◽  
Salman Raza Naqvi ◽  
...  
Keyword(s):  
Dielectric Barrier Discharge ◽  
Barrier Discharge ◽  
Plasma Reactor ◽  
Dielectric Barrier ◽  
X Ray ◽  
Novel Approach ◽  
Spinel Mgal2o4 ◽  
The Stability ◽  
Co Precipitation ◽  
Methane Cracking

The study experimentally investigated a novel approach for producing hydrogen from methane cracking in dielectric barrier discharge catalytic plasma reactor using a nanocatalyst. Plasma-catalytic methane (CH4) cracking was undertaken in a dielectric barrier discharge (DBD) catalytic plasma reactor using Ni/MgAl2O4. The Ni/MgAl2O4 was synthesised through co-precipitation followed customised hydrothermal method. The physicochemical properties of the catalyst were examined using X-ray diffraction (XRD), scanning electron microscopy—energy dispersive X-ray spectrometry (SEM-EDX) and thermogravimetric analysis (TGA). The Ni/MgAl2O4 shows a porous structure spinel MgAl2O4 and thermal stability. In the catalytic-plasma methane cracking, the Ni/MgAl2O4 shows 80% of the maximum conversion of CH4 with H2 selectivity 75%. Furthermore, the stability of the catalyst was encouraging 16 h with CH4 conversion above 75%, and the selectivity of H2 was above 70%. This is attributed to the synergistic effect of the catalyst and plasma. The plasma-catalytic CH4 cracking is a promising technology for the simultaneous H2 and carbon nanotubes (CNTs) production for energy storage applications.

Photocatalytic TiO2 Nanoparticles Activated by Dielectric Barrier Discharge Plasma Assisted Ball Milling

2020 ◽  
Vol 20 (3) ◽  
pp. 1773-1779
Author(s):  
Xuezhang Liu ◽  
Hangyu Long ◽  
Shenghua Hu ◽  
Kui Wen
Keyword(s):  
Ball Milling ◽  
Dielectric Barrier Discharge ◽  
Discharge Plasma ◽  
Barrier Discharge ◽  
Bet Surface Area ◽  
Photocatalytic Efficiency ◽  
Dielectric Barrier Discharge Plasma ◽  
Dielectric Barrier ◽  
X Ray ◽  
Barrier Discharge Plasma

Developing defects on the surface of TiO2 nanoparticles by mechanical treatment is a fascinating approach to enhance photocatalytic efficiency. However, it poses risks to producing bulk defects and phase transformation, which seriously deteriorates photocatalytic performance. Here, activating TiO2 nanoparticles was elaborately fulfilled by using dielectric barrier discharge plasma assisted ball milling (DBDP-milling) as it imposes plasma to nano-scaled particles along with soft mechanical impact. The evolution of surface properties of TiO2 nanoparticles with DBDP-milling durations was inspected using a Fourier transform infrared (FTIR) and an X-ray photoelectron spectrometer (XPS), while the morphology and structure were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD) and Raman spectroscopy. Results showed that DBDP-milling developed a considerable number of oxygen vacancies in TiO2 nanoparticles as well as bulk defects free. These TiO2 nanoparticles formed agglomerates with BET surface area of 37.40 m2/g and exhibited enhanced photocatalytic efficiency.

Interdiffusion in Exchange Biased NiFe/IrMn/CoFe Electrode in Magnetic Tunnel Junctions

2001 ◽  
Vol 690 ◽  
Author(s):  
Jay H. Lee ◽  
Hee D. Jeong ◽  
Il C. Rho ◽  
Chong S. Yoon ◽  
Chang K. Kim
Keyword(s):  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Tunnel Junctions ◽  
Magnetic Tunnel Junction ◽  
Magnetic Film ◽  
Tunnel Barrier ◽  
Plasma Oxidation ◽  
X Ray ◽  
Depth Profiles ◽  
Mn Diffusion

ABSTRACTExtent of Mn diffusion to the plasma-oxidized AlOx tunnel barrier of magnetic tunnel junction was examined using Auger Electron Spectroscopy (AES) and X-Ray Photoelectron Spectroscopy (XPS). A magnetic film stack consisting of Ta/AlOx/CoFe/IrMn/NiFe/Ta was deposited with the AlOx layer treated under different plasma oxidation durations. AES depth profiles showed that Mn diffusion to the AlOx/CoFe interface increased with increasing oxidation after annealing at 300°C. XPS analysis indicated that Mn found at the CoFe/AlOx interface in the over-oxidized electrode was in the form of MnO2. Our research suggests that Mn diffusion was accelerated by preferential oxidation of Mn at the CoFe/AlOx interface.

Plasma oxidation for achieving supported TiO2photocatalysts derived from adsorbed TiCl4using dielectric barrier discharge

2007 ◽  
Vol 40 (6) ◽  
pp. 1763-1768 ◽  
Author(s):  
Xiu-Ling Zhang ◽  
Long-Hui Nie ◽  
Yong Xu ◽  
Chuan Shi ◽  
Xue-Feng Yang ◽  
...  
Keyword(s):  
Dielectric Barrier Discharge ◽  
Barrier Discharge ◽  
Plasma Oxidation ◽  
Dielectric Barrier

Photoemission Study of Metal-Deposited p-Sexiphenyl Film

1999 ◽  
Vol 598 ◽  
Author(s):  
E. Ito ◽  
N. Koch ◽  
H. Oji ◽  
H. Ishii ◽  
G. Leising ◽  
...  
Keyword(s):  
Chemical Reaction ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Alkali Metals ◽  
Ultraviolet Photoelectron Spectroscopy ◽  
Level Shift ◽  
Vacuum Level ◽  
X Ray ◽  
Photoemission Study ◽  
Gap States

ABSTRACTMetal deposition on a p-sexiphenyl (6P) film was studied by ultraviolet photoelectron spectroscopy (UPS), metastable atom electron spectroscopy (MAES), and X-ray photoelectron spectroscopy (XPS). The deposited metals were Au, Mg, and several alkali metals (K, Na, Rb, and Cs). No chemical reaction between 6P and Au or Mg was observed in the measured spectra, while additional gap states appeared in the UPS and MAES spectra by deposition of the alkali metals. The diffusion of Au and Mg atoms into the 6P film was observed in the MAES spectra. We found the trend of the vacuum level shift is different between the systems of the 6P on the Au and its reversed systems (Au on the 6P film), suggesting the different formation of the interface depending on the deposition sequence.

THE EFFECT OF A LiF LAYER ON Al/LiF/Alq3 INTERFACES STUDIED WITH ELECTRON SPECTROSCOPIES

2002 ◽  
Vol 09 (01) ◽  
pp. 425-430 ◽  
Author(s):  
TAKAHIRO YOKOYAMA ◽  
HISAO ISHII ◽  
YUKIO OUCHI ◽  
DAISUKE YOSHIMURA ◽  
KAZUHIKO SEKI ◽  
...  
Keyword(s):  
Energy Level ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Chemical Interaction ◽  
Electron Injection ◽  
Interface Energy ◽  
Ultraviolet Photoelectron Spectroscopy ◽  
X Ray ◽  
Combined Use ◽  
Device Efficiency

The interface of the tris (8-hydroxyquinoline) aluminum ( Alq 3)/ LiF/Al system was investigated with ultraviolet photoelectron spectroscopy (UPS), metastable atom electron spectroscopy (MAES), and X-ray photoelectron spectroscopy (XPS). Strong chemical interaction was observed at Alq 3 on Al interface. By inserting a LiF layer, this interaction is suppressed and interface energy level alignment is changed to reduce a barrier for electron injection. The enhancement of device efficiency is ascribed to these phenomena. The importance of the combined use of various techniques on the same interface is stressed.

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