Role of sputtered Cu atoms and ions in a direct current glow discharge: Combined fluid and Monte Carlo model

1996 ◽  
Vol 79 (3) ◽  
pp. 1279-1286 ◽  
Author(s):  
A. Bogaerts ◽  
R. Gijbels
1999 ◽  
Vol 86 (8) ◽  
pp. 4124-4133 ◽  
Author(s):  
Annemie Bogaerts ◽  
Renaat Gijbels

2012 ◽  
Vol 715-716 ◽  
pp. 697-702
Author(s):  
Debashis Kar ◽  
Stephen D. Sintay ◽  
Gregory S. Rohrer ◽  
Anthony D. Rollett

A Monte Carlo model is presented, in which the interface anisotropy is primarily inclination dependent. A dual grid method is used to determine boundary inclination in discretized digital microstructures. Evolution of the grain boundary character distribution (GBCD) in polycrystalline systems, from an initially random distribution, is inversely correlated with the anisotropy in interfacial energy, as expected.


Author(s):  
Peter Duncumb

Since the early work of Bishop in the 1960's, many have used Monte Carlo techniques for studying the role of electron scattering in the X-ray production process, but the simulation of individual trajectories has always proved too slow to be of use for online analysis. The paper describes a simple model for calculating the distribution curves of ionisation with depth ϕ(ρz) for a variety of target conditions, which are then characterised by a type of exponential expression capable of much faster computation. This expression is built into a practical correction procedure which can be applied to the analysis of all elements from boron upwards.The Monte Carlo model uses a simple multiple scattering cross-section with 50-step trajectories. This cross-section is adjusted to give the correct variation of backscatter coefficient with target atomic number, as shown in Figure 1, and this is the only physical parameter which it is necessary to fit empirically.


1995 ◽  
Vol 78 (4) ◽  
pp. 2233-2241 ◽  
Author(s):  
A. Bogaerts ◽  
R. Gijbels ◽  
W. J. Goedheer

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