Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

Yun Seog Lee; Mark T. Winkler; Sin Cheng Siah; Riley Brandt; Tonio Buonassisi

doi:10.1063/1.3589810

Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

Applied Physics Letters ◽

10.1063/1.3589810 ◽

2011 ◽

Vol 98 (19) ◽

pp. 192115 ◽

Cited By ~ 97

Author(s):

Yun Seog Lee ◽

Mark T. Winkler ◽

Sin Cheng Siah ◽

Riley Brandt ◽

Tonio Buonassisi

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Hall Mobility ◽

Cuprous Oxide ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering

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Deposition and Characterization of Cuprous Oxide Thin Films by Direct Current Magnetron Sputtering

Advanced Science Engineering and Medicine ◽

10.1166/asem.2015.1801 ◽

2015 ◽

Vol 7 (11) ◽

pp. 990-994

Author(s):

V. Vignesh ◽

R. Niveditha ◽

R. Nirmala ◽

R.T. Rajendrakumar ◽

R. Navamathavan

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Cuprous Oxide ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering

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Effects of Oxygen Flux on the Aluminum Doped Zinc Oxide Thin Films By Direct Current Magnetron Sputtering

Physics Procedia ◽

10.1016/j.phpro.2012.03.619 ◽

2012 ◽

Vol 32 ◽

pp. 687-695 ◽

Cited By ~ 3

Author(s):

L.N. Li ◽

Y. Zhao ◽

X.L. Chen ◽

J. Sun ◽

X.D. Zhang

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Direct Current ◽

Oxygen Flux ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering ◽

Aluminum Doped Zinc Oxide

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Characteristics of indium zinc oxide thin films prepared by direct current magnetron sputtering for flexible solar cells

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2010.02.016 ◽

2011 ◽

Vol 95 (1) ◽

pp. 264-269 ◽

Cited By ~ 16

Author(s):

Yu Bin Xiao ◽

Seon Mi Kong ◽

Eun Ho Kim ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Solar Cells ◽

Magnetron Sputtering ◽

Direct Current ◽

Oxide Thin Films ◽

Indium Zinc Oxide ◽

Direct Current Magnetron Sputtering

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Fabrication of single phase transparent conductive cuprous oxide thin films by direct current reactive magnetron sputtering

2017 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic.2017.7919814 ◽

2017 ◽

Author(s):

Ruijin Hong ◽

Jinxia Wang ◽

Chunxian Tao ◽

Dawei Zhang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Cuprous Oxide ◽

Single Phase ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films

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Influence of addition of indium and of post-annealing on structural, electrical and optical properties of gallium-doped zinc oxide thin films deposited by direct-current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.03.068 ◽

2015 ◽

Vol 583 ◽

pp. 201-204 ◽

Cited By ~ 10

Author(s):

Duy Phong Pham ◽

Huu Truong Nguyen ◽

Bach Thang Phan ◽

Van Dung Hoang ◽

Shinya Maenosono ◽

...

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Optical Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

Oxide Thin Films ◽

Electrical And Optical Properties ◽

Post Annealing ◽

Direct Current Magnetron Sputtering

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Surface textured molybdenum doped zinc oxide thin films prepared for thin film solar cells using pulsed direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.03.014 ◽

2011 ◽

Vol 519 (16) ◽

pp. 5571-5576 ◽

Cited By ~ 22

Author(s):

Y.C. Lin ◽

B.L. Wang ◽

W.T. Yen ◽

C.H. Shen

Keyword(s):

Thin Film ◽

Thin Films ◽

Zinc Oxide ◽

Solar Cells ◽

Magnetron Sputtering ◽

Direct Current ◽

Thin Film Solar Cells ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering ◽

Pulsed Direct Current

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Influence of Substrate Temperature on the Properties of Tin-Doped Indium Oxide Thin Films Prepared by Direct Current Magnetron Sputtering

Chinese Journal of Lasers ◽

10.3788/cjl20083512.2031 ◽

2008 ◽

Vol 35 (12) ◽

pp. 2031-2035

Author(s):

曾维强 Zeng Weiqiang ◽

姚建可 Yao Jianke ◽

贺洪波 He Hongbo ◽

邵建达 Shao Jianda

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Indium Oxide ◽

Direct Current ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering ◽

Influence Of Substrate

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Tunable hysteresis in metal-insulator transition of nanostructured vanadium oxide thin films deposited by reactive direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2013.12.007 ◽

2014 ◽

Vol 552 ◽

pp. 218-224 ◽

Cited By ~ 16

Author(s):

Huafu Zhang ◽

Zhiming Wu ◽

Dawei Yan ◽

Xiangdong Xu ◽

Yadong Jiang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Vanadium Oxide ◽

Direct Current ◽

Insulator Transition ◽

Oxide Thin Films ◽

Metal Insulator Transition ◽

Metal Insulator ◽

Direct Current Magnetron Sputtering ◽

Vanadium Oxide Thin Films

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Crystallinity, etchability, electrical and mechanical properties of Ga doped amorphous indium tin oxide thin films deposited by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2013.10.106 ◽

2014 ◽

Vol 559 ◽

pp. 53-57 ◽

Cited By ~ 4

Author(s):

Hyun-Jun Lee ◽

Pung-Keun Song

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering

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Zinc Oxide Thin Films Fabricated with Direct Current Magnetron Sputtering Deposition Technique

10.1063/1.3573740 ◽

2011 ◽

Cited By ~ 2

Author(s):

Jian-Wei Hoon ◽

Kah-Yoong Chan ◽

Jegenathan Krishnasamy ◽

Teck-Yong Tou

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Direct Current ◽

Deposition Technique ◽

Oxide Thin Films ◽

Sputtering Deposition ◽

Direct Current Magnetron Sputtering

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