Changes in the trapping and recombination process of hydrogenated amorphous silicon in the Staebler–Wronski effect

1995 ◽  
Vol 77 (8) ◽  
pp. 3872-3878 ◽  
Author(s):  
P. Kounavis
1991 ◽  
Vol 219 ◽  
Author(s):  
A. Wynveen ◽  
J. Fan ◽  
J. Kakalios ◽  
J. Shinar

ABSTRACTStudies of r.f. sputter deposited hydrogenated amorphous silicon (a-Si:H) find that the light induced decrease in the dark conductivity and photoconductivity (the Staebler-Wronski effect) is reduced when the r.f. power used during deposition is increased. The slower Staebler-Wronski effect is not due to an increase in the initial defect density in the high r.f. power samples, but may result from either the lower hydrogen content or the smaller optical gap found in these films.


2010 ◽  
Vol 1245 ◽  
Author(s):  
Arno H.M. Smets ◽  
Chris R. Wronski ◽  
Miro Zeman ◽  
M. van de Sanden

AbstractIn the recent years more and more theoretical and experimental evidence have been found that the hydrogen bonded to silicon in dense hydrogenated amorphous silicon (a-Si:H) predominantly resides in hydrogenated divacancies. In this contribution we will philosophize about the option that the small fraction of divacancies, missing at least one of its bonded hydrogen, may correspond to some of the native and metastable defect states of a-Si:H. We will discuss that such defect entities are an interesting basis for new and alternative views on the origin of the SWE.


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