Size effects on switching field of isolated and interactive arrays of nanoscale single‐domain Ni bars fabricated using electron‐beam nanolithography

1994 ◽  
Vol 76 (10) ◽  
pp. 6679-6681 ◽  
Author(s):  
Mark S. Wei ◽  
Stephen Y. Chou
Author(s):  
Bin Li ◽  
Anastassios Mavrokefalos ◽  
Jianhua Zhou ◽  
Li Shi ◽  
Paul S. Ho ◽  
...  

A thermal nano-imprint method has been developed to pattern sub-40 nm polymer lines of Hydrogensilsesquioxane (HSQ) and electron beam resist ZEP 520A. The imprint template was the cross section surface of a selectively etched GaAs/AlGaAs heterostructure wafer. Silicon nanowires were formed using reactive ion etching (RIE) of a silicon-on-insulator wafer with the polymer nanolines as an etching mask. The obtained Si nanowires were well defined and continuous for a length up to hundreds of microns. Reaction of the silicon lines with a metal can lead to the formation of silicide interconnect lines, which is used to investigate the size effects on the transport and electromigration properties of interconnects for future microelectronics.


2017 ◽  
Vol 190 ◽  
pp. 138-142 ◽  
Author(s):  
S.J.N. Morrish ◽  
M. Pedersen ◽  
K.F.W. Wong ◽  
I. Todd ◽  
R. Goodall

2002 ◽  
Vol 91 (10) ◽  
pp. 7050 ◽  
Author(s):  
Martha Pardavi-Horvath ◽  
Gabor Vertesy

2011 ◽  
Author(s):  
Yudong Wang ◽  
C. H. de Groot ◽  
D. Claudio-González ◽  
M. D. B. Charlton

2012 ◽  
Vol 112 (2) ◽  
pp. 023903 ◽  
Author(s):  
L. Breth ◽  
D. Suess ◽  
C. Vogler ◽  
B. Bergmair ◽  
M. Fuger ◽  
...  

1997 ◽  
Vol 81 (8) ◽  
pp. 5458-5460 ◽  
Author(s):  
R. O’Barr ◽  
S. Schultz

2012 ◽  
Vol 324 (5) ◽  
pp. 671-676 ◽  
Author(s):  
Gang Jian ◽  
Qiuyun Fu ◽  
Dongxiang Zhou
Keyword(s):  

2005 ◽  
Vol 875 ◽  
Author(s):  
Yifang Cao ◽  
Zong Zong ◽  
Wole Soboyejo

AbstractThis paper presents the results of nanoindentation experimental studies of Au thin films with different thicknesses. The effects of film thickness and microstructure on the hardnesses of electron-beam deposited Au films were studied in terms of Hall-Petch relationship. The effects of different thicknesses on indentation size effects (ISE) are explained within the framework of mechanism-based strain gradient (MSG) theory using the concept of microstructural length scale.


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