Temperature dependent electron‐beam‐induced‐current investigation of electronic damages in silicon due to reactive ion etching
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1994 ◽
Vol 24
(1-3)
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pp. 223-225
1994 ◽
Vol 23
(4)
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pp. 363-367
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2005 ◽
Vol 34
(7)
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pp. 1059-1064
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