Method for thermal diffusivity measurements based on photothermal deflection

1993 ◽  
Vol 74 (12) ◽  
pp. 7078-7084 ◽  
Author(s):  
M. Bertolotti ◽  
G. Liakhou ◽  
R. Li Voti ◽  
F. Michelotti ◽  
C. Sibilia
2004 ◽  
Vol 227 (1-4) ◽  
pp. 410-415 ◽  
Author(s):  
Alex Mathew ◽  
Jyotsna Ravi ◽  
K.N. Madhusoodanan ◽  
K.P.R. Nair ◽  
T.M.A. Rasheed

1988 ◽  
Vol 21 (10S) ◽  
pp. S14-S16 ◽  
Author(s):  
M Bertolotti ◽  
L Fabbri ◽  
C Sibilia ◽  
A Ferrari ◽  
N Sparvieri ◽  
...  

2001 ◽  
Vol 15 (17n19) ◽  
pp. 613-616 ◽  
Author(s):  
E. CORONA-ORGANICHE ◽  
E. LOPEZ-CRUZ

The photothermal technique has been applied for the thermal diffusivity measurements. These measurements based on interferometric photothermal deflection effect were made on ZnxCd1-x Te (x = 5%, 10% and 20%). A simple one-dimensional model is presented to obtain the thermal diffusivity for semiconductor materials in the case of a thermally thick sample that is optically opaque.


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