Direct laser writing of three-dimensional submicron structures using a continuous-wave laser at 532 nm

2010 ◽  
Vol 97 (22) ◽  
pp. 221102 ◽  
Author(s):  
M. Thiel ◽  
J. Fischer ◽  
G. von Freymann ◽  
M. Wegener
2014 ◽  
Vol 23 (02) ◽  
pp. 1450015 ◽  
Author(s):  
Chenyu Yuan ◽  
Jukun Liu ◽  
Tianqing Jia ◽  
Kan Zhou ◽  
Hongxin Zhang ◽  
...  

Direct laser writing (DLW) has become a routine tool for fabricating microstructures through two photon polymerization. Due to the diffraction limit, the resolution is usually larger than a quarter of a wavelength. In this article, by using stimulated emission depletion (STED) inspired lithography, we fabricate nanodot of 81 nm in diameter and nanoline of 93 nm in width in resist with initiator of isopropyl thioxanthone (ITX). An 800 nm, 75-MHz fs laser works as the polymerization light and a 532 nm donut mode continuous wave (CW) laser as the depletion light. This technology is potentially useful for fabrication of super resolution nanostructures.


CLEO: 2013 ◽  
2013 ◽  
Author(s):  
Jonathan Mueller ◽  
Joachim Fischer ◽  
Yatin Jadavji Mange ◽  
Thomas Nann ◽  
Martin Wegener

RSC Advances ◽  
2018 ◽  
Vol 8 (15) ◽  
pp. 8021-8025 ◽  
Author(s):  
Jae Young Kim ◽  
Eun Seok Seo ◽  
Hee Jin Lim ◽  
Hyunmin Kim ◽  
Ji-Won Park ◽  
...  

Micrometer-resolution mass spectrometric imaging of live hippocampal tissue is achieved with a highly efficient desorption of biomolecules using a 532 nm continuous wave laser and gold nanoparticles or graphene oxide as an energy transporter.


Materials ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5279
Author(s):  
Stefan Belle ◽  
Babette Goetzendorfer ◽  
Ralf Hellmann

We report on the challenges in a hybrid sub-micrometer fabrication process while using three dimensional femtosecond direct laser writing and electroplating. With this hybrid subtractive and additive fabrication process, it is possible to generate metallic polarization elements with sub-wavelength dimensions of less than 400 nm in the cladding area. We show approaches for improving the adhesion of freestanding photoresist pillars as well as of the metallic cladding area, and we also demonstrate the avoidance of an inhibition layer and sticking of the freestanding pillars. Three-dimensional direct laser writing in a positive tone photoresist is used as a subtractive process to fabricate free-standing non-metallic photoresist pillars with an area of about 850 nm × 1400 nm, a height of 3000 nm, and a distance between the pillars of less than 400 nm. In a subsequent additive fabrication process, these channels are filled with gold by electrochemical deposition up to a final height of 2200 nm. Finally, the polarization elements are characterized by measuring the degree of polarization in order to show their behavior as quarter- and half-wave plates.


2004 ◽  
Vol 3 (7) ◽  
pp. 444-447 ◽  
Author(s):  
Markus Deubel ◽  
Georg von Freymann ◽  
Martin Wegener ◽  
Suresh Pereira ◽  
Kurt Busch ◽  
...  

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