Laser‐beam deflection measurements and modeling of pulsed laser ablation rate and near‐surface plume densities in vacuum

1991 ◽  
Vol 70 (2) ◽  
pp. 587-593 ◽  
Author(s):  
Peter L. G. Ventzek ◽  
Ronald M. Gilgenbach ◽  
David M. Heffelfinger ◽  
Jeffrey A. Sell
Keyword(s):  
Laser Ablation ◽  
Laser Beam ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Ablation Rate ◽  
Beam Deflection ◽  
Near Surface

Modeling for Chemical-Etching Enhanced Pulsed Laser Ablation

2019 ◽  
Author(s):  
Xing Zhang ◽  
Bo Mao ◽  
Rebecca Histed ◽  
Yiliang Liao
Keyword(s):  
Laser Ablation ◽  
Chemical Etching ◽  
Pulsed Laser ◽  
Target Material ◽  
Pulsed Laser Ablation ◽  
Ablation Rate ◽  
Temperature Dependent ◽  
Laser Shock Processing ◽  
Active Liquid ◽  
Shock Processing

Abstract Pulsed laser ablation (PLA) under active liquid confinement, also known as chemical etching enhanced pulsed laser ablation (CE-PLA), has emerged as a novel laser processing methodology, which breaks the current major limitation in underwater PLA caused by the breakdown plasma and effectively improves the efficiencies of underwater PLA-based processes, such as laser-assisted nano-/micro-machining and laser shock processing. Despite of experimental efforts, little attention has been paid on CE-PLA process modeling. In this study, an extended two-temperature model is proposed to predict the temporal/spatial evolution of the electron-lattice temperature and the ablation rate in the CE-PLA process. The model is developed with considerations on the temperature-dependent electronic thermal properties and optical properties of the target material. The ablation rate is formulated by incorporating the mutual promotion between ablation and etching processes. The simulation results are validated by the experimental data of CE-PLA of zinc under the liquid confinement of hydrogen peroxide.

EFFECT OF LASER WAVELENGTH AND ABLATION TIME ON PULSED LASER ABLATION SYNTHESIS OF AL NANOPARTICLES IN ETHANOL

2012 ◽  
Vol 05 ◽  
pp. 58-65 ◽  
Author(s):  
A. BALADI ◽  
R. SARRAF MAMOORY
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Ablation Rate ◽  
Laser Wavelength ◽  
Aluminum Nanoparticles ◽  
Ablation Efficiency ◽  
Ablation Time ◽  
Al Nanoparticles ◽  
Ablated Mass

Aluminum nanoparticles were synthesized by pulsed laser ablation of Al targets in ethanol for 5-15 minutes using the 1064 and 533 nm wavelengths of a Nd:YAG laser with energies of 280-320 mJ per pulse. It has been found that higher wavelength leads to significantly higher ablation efficiency, and finer spherical nanoparticles are also synthesized. Besides, it was obvious that higher ablation time resulted in higher ablated mass, while lower ablation rate was observed. Finer nanoparticles, moreover, are synthesized in higher ablation times.

Surface Decontamination via Plasma Mediated Ultra-Short Pulsed Laser Ablation

2008 ◽  
Author(s):  
Xiaoliang Wang ◽  
Zhixiong Guo
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Laser Beam ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Vacuum System ◽  
Plasma Cloud ◽  
Blood Contamination ◽  
System A ◽  
Plane Area

Ultra-short pulsed laser removal of thin film blood contamination at glass surface has been studied. Utilizing plasma mediated ablation effect, the blood contamination was transformed into plasma cloud and collected with a vacuum system. A laser beam (wavelength 1552nm, pulse duration 1.2 picosecond) is focused into a working spot and scanned over the contaminated x-y plane area via an automated stage. The ablation effects of different laser parameters (pulse repetition rate, pulse energy) are demonstrated. The ablation result is evaluated with microscope.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

scholarly journals Doping nanoparticles using pulsed laser ablation in a liquid containing the doping agent

2019 ◽  
Vol 1 (10) ◽  
pp. 3963-3972 ◽  
Author(s):  
Arsène Chemin ◽  
Julien Lam ◽  
Gaétan Laurens ◽  
Florian Trichard ◽  
Vincent Motto-Ros ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Doping Agent ◽  
Laser Ablation In Liquids ◽  
Dope Nanoparticles

While doping is crucial for numerous technological applications, its control remains difficult especially when the material is reduced down to the nanometric scale. We suggest a new way to dope nanoparticles using laser ablation in liquids.

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