Electrical characterization of organic resistive memory with interfacial oxide layers formed by O2 plasma treatment

Byungjin Cho; Sunghoon Song; Yongsung Ji; Takhee Lee

doi:10.1063/1.3478840

Electrical characterization of organic resistive memory with interfacial oxide layers formed by O2 plasma treatment

Applied Physics Letters ◽

10.1063/1.3478840 ◽

2010 ◽

Vol 97 (6) ◽

pp. 063305 ◽

Cited By ~ 35

Author(s):

Byungjin Cho ◽

Sunghoon Song ◽

Yongsung Ji ◽

Takhee Lee

Keyword(s):

Plasma Treatment ◽

Electrical Characterization ◽

Resistive Memory ◽

Oxide Layers ◽

O2 Plasma Treatment ◽

O2 Plasma

Download Full-text

Characterization of the n-GaAs Surface after CF4, SF6, CCl2F2, and CCl2F2 : O2 Plasma Treatment by Photoreflectance

phys stat sol (a) ◽

10.1002/pssa.2211280220 ◽

1991 ◽

Vol 128 (2) ◽

pp. 435-446 ◽

Cited By ~ 3

Author(s):

Th. Dittrich ◽

S. John ◽

W. John

Keyword(s):

Plasma Treatment ◽

Gaas Surface ◽

O2 Plasma Treatment ◽

O2 Plasma

Download Full-text

Impact of O2 Plasma Treatment on Novel Amorphous Oxide InWZnO on Conductive Bridge Random Access Memory

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2021.127539 ◽

2021 ◽

pp. 127539

Author(s):

Chih-Chieh Hsu ◽

Po-Tsun Liu ◽

Kai-Jhih Gan ◽

Dun-Bao Ruan ◽

Yu-Chuan Chiu ◽

...

Keyword(s):

Plasma Treatment ◽

Random Access ◽

Random Access Memory ◽

Access Memory ◽

Amorphous Oxide ◽

Conductive Bridge ◽

O2 Plasma Treatment ◽

O2 Plasma

Download Full-text

Influence of O2 plasma treatment on NiO x layer in perovskite solar cells

Japanese Journal of Applied Physics ◽

10.7567/jjap.57.04fs07 ◽

2018 ◽

Vol 57 (4S) ◽

pp. 04FS07 ◽

Cited By ~ 9

Author(s):

Yoshihiko Nishihara ◽

Masayuki Chikamatsu ◽

Said Kazaoui ◽

Tetsuhiko Miyadera ◽

Yuji Yoshida

Keyword(s):

Solar Cells ◽

Plasma Treatment ◽

Perovskite Solar Cells ◽

O2 Plasma Treatment ◽

O2 Plasma

Download Full-text

Ar/O2 plasma treatment of carbon nanotube membranes for enhanced removal of zinc from water and wastewater: A dynamic sorption-filtration process

The Science of The Total Environment ◽

10.1016/j.scitotenv.2018.11.335 ◽

2019 ◽

Vol 655 ◽

pp. 1270-1278 ◽

Cited By ~ 8

Author(s):

Sharafat Ali ◽

Izaz Ali Shah ◽

Aziz Ahmad ◽

Javed Nawab ◽

Haiou Huang

Keyword(s):

Carbon Nanotube ◽

Plasma Treatment ◽

Filtration Process ◽

Dynamic Sorption ◽

Nanotube Membranes ◽

Carbon Nanotube Membranes ◽

O2 Plasma Treatment ◽

Water And Wastewater ◽

O2 Plasma

Download Full-text

Electrical characterization of resistive memory in metal-Pr0.7Ca0.3MnO3 interface: A future non-volatile memory device

2009 10th Annual Non-Volatile Memory Technology Symposium (NVMTS) ◽

10.1109/nvmt.2009.5429779 ◽

2009 ◽

Author(s):

N. Das ◽

Y.Y. Xue ◽

Y.Q. Wang ◽

C.W. Chu

Keyword(s):

Electrical Characterization ◽

Memory Device ◽

Resistive Memory ◽

Non Volatile Memory ◽

Volatile Memory

Download Full-text

Effect of O2 Plasma Treatment on Hole-Injection Enhancement for Organic Light-Emitting Devices with Transparent Au:Al Anodes

Journal of the Korean Physical Society ◽

10.3938/jkps.50.1327 ◽

2007 ◽

Vol 50 (5) ◽

pp. 1327 ◽

Cited By ~ 4

Author(s):

Su Hwan Lee ◽

Dal Ho Kim ◽

Hee-Doo Yang ◽

Gon-Sub Lee ◽

Jea-Gun Park

Keyword(s):

Plasma Treatment ◽

Hole Injection ◽

Light Emitting ◽

Light Emitting Devices ◽

Organic Light ◽

O2 Plasma Treatment ◽

Organic Light Emitting Devices ◽

O2 Plasma

Download Full-text

Selective Etching of HfO2 by Using Inductively-Coupled Ar/C4F8 Plasmas and the Removal of Etch Residue on Si by Using an O2 Plasma Treatment

Journal of the Korean Physical Society ◽

10.3938/jkps.53.1675 ◽

2008 ◽

Vol 53 (3) ◽

pp. 1675-1679 ◽

Cited By ~ 7

Author(s):

K. S. Min ◽

B. J. Park ◽

S. W. Kim ◽

S. K. Kang ◽

G. Y. Yeom ◽

...

Keyword(s):

Plasma Treatment ◽

Selective Etching ◽

Inductively Coupled ◽

O2 Plasma Treatment ◽

Etch Residue ◽

O2 Plasma

Download Full-text

Contribution of O2 plasma treatment and amine modified GOs on film properties of conductive PEDOT:PSS: Application in indium tin oxide free solution processed blue OLED

Current Applied Physics ◽

10.1016/j.cap.2019.04.018 ◽

2019 ◽

Vol 19 (8) ◽

pp. 910-916 ◽

Cited By ~ 2

Author(s):

Halide Diker ◽

Fatih Yesil ◽

Canan Varlikli

Keyword(s):

Plasma Treatment ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Free Solution ◽

Film Properties ◽

Solution Processed ◽

O2 Plasma Treatment ◽

O2 Plasma

Download Full-text

X-ray diffraction and electrical characterization of photo-CVD zirconium oxide layers

Applied Surface Science ◽

10.1016/s0169-4332(02)01406-x ◽

2003 ◽

Vol 208-209 ◽

pp. 374-377 ◽

Cited By ~ 6

Author(s):

J.J. Yu ◽

I.W. Boyd

Keyword(s):

Zirconium Oxide ◽

Electrical Characterization ◽

X Ray Diffraction ◽

Oxide Layers ◽

X Ray

Download Full-text

Effect of O2 plasma treatment on physical, electrical, and reliability characteristics of low dielectric constant materials

Thin Solid Films ◽

10.1016/j.tsf.2014.07.069 ◽

2014 ◽

Vol 572 ◽

pp. 44-50 ◽

Cited By ~ 8

Author(s):

Yi-Lung Cheng ◽

Bing-Hong Lin ◽

Syuan-Wei Huang

Keyword(s):

Dielectric Constant ◽

Plasma Treatment ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Reliability Characteristics ◽

O2 Plasma Treatment ◽

Low Dielectric Constant Materials ◽

O2 Plasma

Download Full-text