Growth by molecular‐beam epitaxy and characterization of (InAs)m(GaAs)mshort period superlattices on InP substrates

1990 ◽  
Vol 68 (3) ◽  
pp. 1282-1286 ◽  
Author(s):  
Hideo Toyoshima ◽  
Takayoshi Anan ◽  
Kenichi Nishi ◽  
Toshinari Ichihashi ◽  
Akihiko Okamoto
2003 ◽  
Vol 42 (Part 1, No. 7A) ◽  
pp. 4288-4289 ◽  
Author(s):  
Yuichi Kawamura ◽  
Masanobu Amano ◽  
Koichi Ouchi ◽  
Naohisa Inoue

1993 ◽  
Vol 326 ◽  
Author(s):  
N.J. Bulitka ◽  
A. Gupta ◽  
B.J. Robinson ◽  
D.A. Thompson ◽  
G.C. Weatherly ◽  
...  

1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


2017 ◽  
Vol 9 (36) ◽  
pp. 30786-30796 ◽  
Author(s):  
Yoon-Ho Choi ◽  
Dong-Hyeok Lim ◽  
Jae-Hun Jeong ◽  
Dambi Park ◽  
Kwang-Sik Jeong ◽  
...  

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