Area-selected Ion Milling for Reflection Wavefront Error Correction of Soft X-ray Multilayer Mirrors

2010 ◽  
Author(s):  
Toshihide Tsuru ◽  
Yu Sakai ◽  
Tadashi Hatano ◽  
Masaki Yamamoto ◽  
R. Garrett ◽  
...  
Keyword(s):  
Error Correction ◽  
Ion Milling ◽  
Multilayer Mirrors ◽  
X Ray ◽  
Wavefront Error

Phase identification in SiC whisker reinforced Al2O3-R2O3-based composites

1992 ◽  
Vol 50 (1) ◽  
pp. 152-153
Author(s):  
C.M. Sung ◽  
K.J. Ostreicher ◽  
M.L. Huckabee ◽  
S.T. Buljan
Keyword(s):  
Analytical Electron Microscopy ◽  
Phase Identification ◽  
Reinforced Composites ◽  
Ion Milling ◽  
X Ray ◽  
Binary Oxides ◽  
Analytical Electron ◽  
The Matrix ◽  
Second Phases ◽  
Convergent Beam

A series of binary oxides and SiC whisker reinforced composites both having a matrix composed of an α-(Al, R)2O3 solid solution (R: rare earth) have been studied by analytical electron microscopy (AEM). The mechanical properties of the composites as well as crystal structure, composition, and defects of both second phases and the matrix were investigated. The formation of various second phases, e.g. garnet, β-Alumina, or perovskite structures in the binary Al2O3-R2O3 and the ternary Al2O3-R2O3-SiC(w) systems are discussed.Sections of the materials having thicknesses of 100 μm - 300 μm were first diamond core drilled. The discs were then polished and dimpled. The final step was ion milling with Ar+ until breakthrough occurred. Samples prepared in this manner were then analyzed using the Philips EM400T AEM. The low-Z energy dispersive X-ray spectroscopy (EDXS) data were obtained and correlated with convergent beam electron diffraction (CBED) patterns to identify phase compositions and structures. The following EDXS parameters were maintained in the analyzed areas: accelerating voltage of 120 keV, sample tilt of 12° and 20% dead time.

Correcting for Spherical Aberrations in Solid Immersion Microscopy Using a Deformable Mirror

2011 ◽  
Author(s):  
Y. Lu ◽  
E. Ramsay ◽  
C. Stockbridge ◽  
F. H. Koklu ◽  
A. Yurt ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Error Correction ◽  
Deformable Mirror ◽  
Wafer Thickness ◽  
Wavefront Error ◽  
Substrate Wafer ◽  
Thickness Error

Abstract We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.

Interdiffusion in soft X-ray multilayer mirrors

1996 ◽  
Vol 286 (1-2) ◽  
pp. 176-183 ◽  
Author(s):  
H.L Bai ◽  
E.Y Jiang ◽  
C.D Wang
Keyword(s):  
Multilayer Mirrors ◽  
X Ray

Soft X-Ray Optics Using Multilayer Mirrors

1985 ◽  
Vol 24 (1) ◽  
Author(s):  
Ping Lee ◽  
Roger J. Bartlett ◽  
Don R. Kania
Keyword(s):  
Multilayer Mirrors ◽  
Ray Optics ◽  
X Ray

Aging effect of Co/C soft X-ray multilayer mirrors

1997 ◽  
Vol 42 (6) ◽  
pp. 454-457 ◽  
Author(s):  
Haili Bai ◽  
Enyong Jiang ◽  
Renyu Tian ◽  
Cunda Wang
Keyword(s):  
Aging Effect ◽  
Multilayer Mirrors ◽  
X Ray

Si adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors

2006 ◽  
Vol 600 (6) ◽  
pp. 1405-1408 ◽  
Author(s):  
M.J.H. Kessels ◽  
J. Verhoeven ◽  
F.D. Tichelaar ◽  
F. Bijkerk
Keyword(s):  
Multilayer Mirrors ◽  
X Ray

scholarly journals Three-Dimensionally Controlled Ion Milling for Reflection Phase Manipulation of EUV Multilayer Mirrors

2011 ◽  
Author(s):  
T. Tsuru ◽  
T. Hatano ◽  
M. Yamamoto ◽  
Ian McNulty ◽  
Catherine Eyberger ◽  
...  
Keyword(s):  
Ion Milling ◽  
Multilayer Mirrors ◽  
Reflection Phase ◽  
Phase Manipulation

scholarly journals Nested Kirkpatrick–Baez (Montel) optics for hard X-rays

2015 ◽  
Vol 48 (2) ◽  
pp. 558-564 ◽  
Author(s):  
Giacomo Resta ◽  
Boris Khaykovich ◽  
David Moncton
Keyword(s):  
Ray Tracing ◽  
Compton Scattering ◽  
Analytical Procedure ◽  
X Rays ◽  
Multilayer Mirrors ◽  
Comprehensive Description ◽  
X Ray ◽  
Inverse Compton Scattering ◽  
Inverse Compton ◽  
Proper Orientation

A comprehensive description and ray-tracing simulations are presented for symmetric nested Kirkpatrick–Baez (KB) mirrors, commonly used at synchrotrons and in commercial X-ray sources. This paper introduces an analytical procedure for determining the proper orientation between the two surfaces composing the nested KB optics. This procedure has been used to design and simulate collimating optics for a hard-X-ray inverse Compton scattering source. The resulting optical device is composed of two 12 cm-long parabolic surfaces coated with a laterally graded multilayer and is capable of collimating a 12 keV beam with a divergence of 5 mrad (FWHM) by a factor of ∼250. A description of the ray-tracing software that was developed to simulate the graded multilayer mirrors is included.

Intrinsic roughness and interfaces of Cr/Be multilayers

2021 ◽  
Vol 54 (6) ◽  
Author(s):  
Roman Pleshkov ◽  
Nikolay Chkhalo ◽  
Vladimir Polkovnikov ◽  
Mikhail Svechnikov ◽  
Maria Zorina
Keyword(s):  
Atomic Force Microscopy ◽  
Optical Contrast ◽  
Multilayer Mirrors ◽  
X Ray ◽  
Force Microscopy ◽  
Layer Material ◽  
Multilayer Mirror ◽  
X Ray Scattering ◽  
Atomic Force ◽  
Sharp Structure

The structures of Cr/Be multilayer mirror interfaces are investigated using X-ray reflectometry, diffuse X-ray scattering and atomic force microscopy. The combination of these methods makes it possible to separate the contributions of roughness and interlayer diffusion/intermixing for each sample. In the range of period thicknesses of 2.26–0.8 nm, it is found that the growth roughness of the Cr/Be multilayer mirrors does not depend on the period thickness and is ∼0.2 nm. The separation of roughness and diffuseness allows estimation of layer material intermixing and the resulting drop in the optical contrast, which is from 0.85 to 0.17 in comparison with an ideally sharp structure.

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