Role of Current and Magnetic Field Structure at Directed Extreme Ultraviolet Generation in Plasma Discharge for Nano-Lithography
Keyword(s):
2014 ◽
Vol 54
(8)
◽
pp. 996-999
◽
Keyword(s):
1971 ◽
Vol 43
◽
pp. 435-442
◽
Keyword(s):
1971 ◽
Vol 43
◽
pp. 237-242
Keyword(s):
1991 ◽
Vol 96
(A5)
◽
pp. 7853
◽
2019 ◽
Vol 485
(4)
◽
pp. 5532-5542
◽
Keyword(s):
1980 ◽
Vol 91
◽
pp. 323-326
Keyword(s):