A numerical simulation of rf glow discharge containing an electronegative gas composition

1990 ◽  
Vol 67 (7) ◽  
pp. 3264-3268 ◽  
Author(s):  
Yong‐Ho Oh ◽  
Nak‐Heon Choi ◽  
Duk‐In Choi
Keyword(s):  
Numerical Simulation ◽  
Glow Discharge ◽  
Gas Composition ◽  
Rf Glow Discharge

Current-voltage characteristics of aluminium nitride films formed by RF glow discharge

1980 ◽  
Vol 13 (6) ◽  
pp. L101-L105 ◽  
Author(s):  
D Mangalaraj ◽  
M Radhakrishnan ◽  
C Balasubramanian ◽  
A R Kasilingam
Keyword(s):  
Glow Discharge ◽  
Aluminium Nitride ◽  
Current Voltage ◽  
Rf Glow Discharge ◽  
Current Voltage Characteristics

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Methods of Improving Glow-Discharge-Deposited a-Si1−xGex:H

1991 ◽  
Vol 219 ◽  
Author(s):  
Y. S. Tsuo ◽  
Y. Xu ◽  
E. A. Ramsay ◽  
R. S. Crandall ◽  
S. J. Salomon ◽  
...  
Keyword(s):  
Material Processing ◽  
Glow Discharge ◽  
Substrate Temperature ◽  
Gas Mixtures ◽  
Gas Composition ◽  
Processing Methods ◽  
Helium 4 ◽  
Process Gas

ABSTRACTWe have studied methods of improving glow-discharge-deposited a-Si1−x Gex :H alloys deposited using silane and germane gas mixtures. Material processing methods studied include (1) varying the substrate temperature from 170° to 280°C, (2) varying the process gas composition and pressure, (3) dilution of the feed gas by hydrogen, argon, or helium, (4) enhancing etching during deposition by adding small amounts of XeF2 vapor into the process gas, and (5) postdeposition annealing and/or hydrogenation.

Deposition of organosilicon coatings from trimethylsilyl acetate and oxygen gases in capacitively coupled RF glow discharge

2020 ◽  
Vol 149 ◽  
pp. 105927
Author(s):  
Štěpánka Kelarová ◽  
Vojtěch Homola ◽  
Monika Stupavká ◽  
Martin Čermák ◽  
Jiří Vohánka ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Capacitively Coupled ◽  
Rf Glow Discharge

Stabilized aqueous dispersion of multi-walled carbon nanotubes obtained by RF glow-discharge treatment

2009 ◽  
Vol 11 (7) ◽  
pp. 1817-1822 ◽  
Author(s):  
Leron Vandsburger ◽  
Edward J. Swanson ◽  
Jason Tavares ◽  
Jean-Luc Meunier ◽  
Sylvain Coulombe
Keyword(s):  
Carbon Nanotubes ◽  
Glow Discharge ◽  
Aqueous Dispersion ◽  
Discharge Treatment ◽  
Multi Walled Carbon Nanotubes ◽  
Rf Glow Discharge ◽  
Walled Carbon Nanotubes
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