Observation of radiation defects generated in edge defined film fed growth silicon ribbons under 400 kV irradiation in the high‐resolution electron microscope

1988 ◽  
Vol 64 (3) ◽  
pp. 1125-1130 ◽  
Author(s):  
Jerzy Katcki ◽  
Dieter Ast
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Radiation Defects ◽  
Resolution Electron ◽  
High Resolution Electron Microscope

An Analysis of Dissociation of Molecules in a High Resolution Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 486-487
Author(s):  
Mihir Parikh
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Cross Sections ◽  
Resolving Power ◽  
Peak Intensity ◽  
Molecular Film ◽  
Resolution Electron ◽  
Dissociation Cross Section ◽  
High Resolution Electron Microscope ◽  
The Stability

It is well known that the resolution of bio-molecules in a high resolution electron microscope depends not just on the physical resolving power of the instrument, but also on the stability of these molecules under the electron beam. Experimentally, the damage to the bio-molecules is commo ly monitored by the decrease in the intensity of the diffraction pattern, or more quantitatively by the decrease in the peaks of an energy loss spectrum. In the latter case the exposure, EC, to decrease the peak intensity from IO to I’O can be related to the molecular dissociation cross-section, σD, by EC = ℓn(IO /I’O) /ℓD. Qu ntitative data on damage cross-sections are just being reported, However, the microscopist needs to know the explicit dependence of damage on: (1) the molecular properties, (2) the density and characteristics of the molecular film and that of the support film, if any, (3) the temperature of the molecular film and (4) certain characteristics of the electron microscope used

Computer-Controlled Hrem Alignment Using Automated Diffractogram Analysis

1990 ◽  
Vol 48 (1) ◽  
pp. 532-533
Author(s):  
G.Y. Fan ◽  
O.L. Krivanek
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
The Other ◽  
Full Information ◽  
Resolution Electron ◽  
Skilled Operator ◽  
Automatic Alignment ◽  
High Resolution Electron Microscope ◽  
Computer Controlled ◽  
Recorded Image

Full alignment of a high resolution electron microscope (HREM) requires five parameters to be optimized: the illumination angle (beam tilt) x and y, defocus, and astigmatism magnitude and orientation. Because neither voltage nor current centering lead to the correct illumination angle, all the adjustments must be done on the basis of observing contrast changes in a recorded image. The full alignment can be carried out by a computer which is connected to a suitable image pick-up device and is able to control the microscope, sometimes with greater precision and speed than even a skilled operator can achieve. Two approaches to computer-controlled (automatic) alignment have been investigated. The first is based on measuring the dependence of the overall contrast in the image of a thin amorphous specimen on the relevant parameters, the other on measuring the image shift. Here we report on our progress in developing a new method, which makes use of the full information contained in a computed diffractogram.

scholarly journals A New High-Resolution Electron Microscope with Easy Operation System for Nano Analysis

2002 ◽  
Vol 8 (S02) ◽  
pp. 1106-1107
Author(s):  
M. Matsushita ◽  
M. Ohsaki ◽  
Y. Kondo ◽  
M. Naruse ◽  
T. Honda ◽  
...  
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Operation System ◽  
Resolution Electron ◽  
High Resolution Electron Microscope ◽  
Easy Operation
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