Cross‐sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus‐doped polycrystalline silicon gate

1986 ◽  
Vol 59 (8) ◽  
pp. 2773-2776 ◽  
Author(s):  
C. Y. Wong ◽  
F. S. Lai ◽  
P. A. McFarland ◽  
F. M. d’Heurle ◽  
C. Y. Ting
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