Ultrashort high quality electron beam from laser wakefield accelerator using two-step plasma density profile

2010 ◽  
Vol 81 (3) ◽  
pp. 033307 ◽  
Author(s):  
Xiongwei Zhu
2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Constantin Aniculaesei ◽  
Vishwa Bandhu Pathak ◽  
Hyung Taek Kim ◽  
Kyung Hwan Oh ◽  
Byung Ju Yoo ◽  
...  

Abstract The phase velocity of the wakefield of a laser wakefield accelerator can, theoretically, be manipulated by shaping the longitudinal plasma density profile, thus controlling the parameters of the generated electron beam. We present an experimental method where using a series of shaped longitudinal plasma density profiles we increased the mean electron peak energy more than 50%, from 175 ± 1 MeV to 262 ± 10 MeV and the maximum peak energy from 182 MeV to 363 MeV. The divergence follows closely the change of mean energy and decreases from 58.9 ± 0.45 mrad to 12.6 ± 1.2 mrad along the horizontal axis and from 35 ± 0.3 mrad to 8.3 ± 0.69 mrad along the vertical axis. Particle-in-cell simulations show that a ramp in a plasma density profile can affect the evolution of the wakefield, thus qualitatively confirming the experimental results. The presented method can increase the electron energy for a fixed laser power and at the same time offer an energy tunable source of electrons.


2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Constantin Aniculaesei ◽  
Vishwa Bandhu Pathak ◽  
Hyung Taek Kim ◽  
Kyung Hwan Oh ◽  
Byung Ju Yoo ◽  
...  

An amendment to this paper has been published and can be accessed via a link at the top of the paper.


2018 ◽  
Vol 16 (7) ◽  
pp. 071202
Author(s):  
Jiaqi Liu Jiaqi Liu ◽  
Wentao Li Wentao Li ◽  
Jiansheng Liu Jiansheng Liu ◽  
Wentao Wang Wentao Wang ◽  
Rong Qi Rong Qi ◽  
...  

2017 ◽  
Vol 24 (2) ◽  
pp. 023108 ◽  
Author(s):  
Y. F. Li ◽  
D. Z. Li ◽  
K. Huang ◽  
M. Z. Tao ◽  
M. H. Li ◽  
...  

2018 ◽  
Vol 25 (2) ◽  
pp. 023106 ◽  
Author(s):  
Zhiyong Qin ◽  
Changhai Yu ◽  
Wentao Wang ◽  
Jiansheng Liu ◽  
Wentao Li ◽  
...  

2007 ◽  
Vol 90 (15) ◽  
pp. 151501 ◽  
Author(s):  
N. M. Hafz ◽  
I. W. Choi ◽  
J. H. Sung ◽  
H. T. Kim ◽  
K.-H. Hong ◽  
...  

2010 ◽  
Author(s):  
M. S. Bakeman ◽  
J. Van Tilborg ◽  
K. Nakamura ◽  
A. Gonsalves ◽  
J. Osterhoff ◽  
...  

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