Holographic photoelectrochemical etching of diffraction gratings inn‐InP andn‐GaInAsP for distributed feedback lasers

1985 ◽  
Vol 57 (1) ◽  
pp. 39-44 ◽  
Author(s):  
R. M. Lum ◽  
A. M. Glass ◽  
F. W. Ostermayer ◽  
P. A. Kohl ◽  
A. A. Ballman ◽  
...  
1986 ◽  
Vol 75 ◽  
Author(s):  
Richard Matz

AbstractQuarter micrometer period diffraction gratings having depth-to-spacing ratios around 0.5 have been photochemically etched in p-GaAs using direct holographic illumination with 257 nm UV light. The results suggest the interaction of the incident light with the etched grating. The etch process is represented with the aid of a potential-pH diagram calculated from literature data.


2002 ◽  
Vol 38 (25) ◽  
pp. 1676 ◽  
Author(s):  
H. Wenzel ◽  
M. Braun ◽  
J. Fricke ◽  
A. Klehr ◽  
A. Knauer ◽  
...  

1987 ◽  
Vol 62 (5) ◽  
pp. 2153-2154 ◽  
Author(s):  
K. Wakao ◽  
K. Kihara ◽  
Y. Kotaki ◽  
T. Kusunoki ◽  
H. Sudo ◽  
...  

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