A noncharge-sheet channel potential and drain current model for dynamic-depletion silicon-on-insulator metal-oxide-semiconductor field-effect transistors

2010 ◽  
Vol 107 (5) ◽  
pp. 054507 ◽  
Author(s):  
Jian Zhang ◽  
Lining Zhang ◽  
Jin He ◽  
Mansun Chan
2002 ◽  
Vol 743 ◽  
Author(s):  
Z. Y. Fan ◽  
J. Li ◽  
J. Y. Lin ◽  
H. X. Jiang ◽  
Y. Liu ◽  
...  

ABSTRACTThe fabrication and characterization of AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOSHFETs) with the δ-doped barrier are reported. The incorporation of the SiO2 insulated-gate and the δ-doped barrier into HFET structures reduces the gate leakage and improves the 2D channel carrier mobility. The device has a high drain-current-driving and gate-control capabilities as well as a very high gate-drain breakdown voltage of 200 V, a cutoff frequency of 15 GHz and a maximum frequency of oscillation of 34 GHz for a gate length of 1 μm. These characteristics indicate a great potential of this structure for high-power-microwave applications.


2009 ◽  
Vol 48 (9) ◽  
pp. 091201
Author(s):  
Jong Pil Kim ◽  
Jae Young Song ◽  
Sang Wan Kim ◽  
Jae Hyun Park ◽  
Woo Young Choi ◽  
...  

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