Carbon tetrachloride plasma etching of GaAs and InP: A kinetic study utilizing nonperturbative optical techniques

1982 ◽  
Vol 53 (8) ◽  
pp. 5908-5919 ◽  
Author(s):  
Richard A. Gottscho ◽  
Gerald Smolinsky ◽  
Randolph H. Burton
Keyword(s):  
Carbon Tetrachloride ◽  
Kinetic Study ◽  
Plasma Etching ◽  
Optical Techniques

Studies in polymerization - XV. The photosensitized initiation of vinyl polymerization by manganese carbonyl

1965 ◽  
Vol 284 (1399) ◽  
pp. 455-468 ◽  
Keyword(s):  
Carbon Tetrachloride ◽  
Quantum Yield ◽  
Methyl Methacrylate ◽  
Kinetic Study ◽  
Chemical Nature ◽  
Reaction Scheme ◽  
Low Concentration ◽  
Vinyl Polymerization ◽  
Manganese Carbonyl ◽  
Kinetic Features

It has been found that a system consisting of manganese carbonyl and a low concentration of carbon tetrachloride can act as an efficient photoinitiator of vinyl polymerization. This paper describes a kinetic study of the mechanism of photoinitiation at λ = 4358 Å, in which methyl methacrylate was the monomer. Trichloromethyl radicals are shown to be the initiating species. The main observations are consistent with a reaction scheme in which a primary product F of the photolysis of the carbonyl forms an adduct with carbon tetrachloride. This adduct may either dissociate into trichloromethyl radicals or be destroyed by reaction with F . Suggestions are made as to the chemical nature of F . Other mechanisms are considered which explain certain of the kinetic features observed. The quantum yield of photoinitiation is a function of [CCl 4 ]/ I abs and rises monotonically with a limit of unity.

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