Improvement of reproducible resistance switching in polycrystalline tungsten oxide films by in situ oxygen annealing

2010 ◽  
Vol 96 (7) ◽  
pp. 072103 ◽  
Author(s):  
D. S. Shang ◽  
L. Shi ◽  
J. R. Sun ◽  
B. G. Shen ◽  
F. Zhuge ◽  
...  
Keyword(s):  
Tungsten Oxide ◽  
Oxide Films ◽  
Resistance Switching ◽  
Oxygen Annealing ◽  
Polycrystalline Tungsten

Self-doped tungsten oxide films induced by in situ carbothermal reduction for high performance electrochromic devices

2020 ◽  
Vol 8 (40) ◽  
pp. 13999-14006
Author(s):  
Lijun Zhou ◽  
Peng Wei ◽  
Huajing Fang ◽  
Wenting Wu ◽  
Liangliang Wu ◽  
...  
Keyword(s):  
Tungsten Oxide ◽  
Carbothermal Reduction ◽  
High Performance ◽  
Oxygen Vacancies ◽  
Low Cost ◽  
Oxide Films ◽  
Electrochromic Devices

Self-doping WO3−x with nanopores and oxygen vacancies is prepared by a low-cost and eco-friendly route for high performance electrochromic devices.

In situ spectroscopic ellipsometry of electrochromic amorphous tungsten oxide films

2015 ◽  
Vol 140 ◽  
pp. 77-85 ◽  
Author(s):  
Hubert Camirand ◽  
Bill Baloukas ◽  
Jolanta Ewa Klemberg-Sapieha ◽  
Ludvik Martinu
Keyword(s):  
Tungsten Oxide ◽  
Spectroscopic Ellipsometry ◽  
Oxide Films

Enhancing oxidation resistance of Cu during repeated melting by the in-situ formation of protective oxide films

2021 ◽  
Vol 286 ◽  
pp. 129234
Author(s):  
Yongli Guo ◽  
Hui Cai ◽  
Zhe Wang ◽  
Xin Wang ◽  
Peng Cao ◽  
...  
Keyword(s):  
Oxidation Resistance ◽  
Oxide Films ◽  
Protective Oxide ◽  
In Situ Formation

scholarly journals Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 4169
Author(s):  
Gennady Gorokh ◽  
Natalia Bogomazova ◽  
Abdelhafed Taleb ◽  
Valery Zhylinski ◽  
Timur Galkovsky ◽  
...  
Keyword(s):  
Tungsten Oxide ◽  
Gas Sensing ◽  
Oxide Films ◽  
High Sensitivity ◽  
Anodic Alumina ◽  
Film Deposition ◽  
Silicon Substrates ◽  
Layer By Layer ◽  
Gas Sensitivity ◽  
Nanoporous Anodic Alumina

The process of layer-by-layer ionic deposition of tin-tungsten oxide films on smooth silicon substrates and nanoporous anodic alumina matrices has been studied. To achieve the film deposition, solutions containing cationic SnF2 or SnCl2 and anionic Na2WO4 or (NH4)2O·WO3 precursors have been used. The effect of the solution compositions on the films deposition rates, morphology, composition, and properties was investigated. Possible mechanisms of tin-tungsten oxide films deposition into the pores and on the surface of anodic alumina are discussed. The electro-physical and gas-sensitive properties of nanostructured SnxWyOz films have been investigated. The prepared nanocomposites exhibit stable semiconductor properties characterized by high resistance and low temperature coefficient of electrical resistance of about 1.6 × 10−3 K−1. The sensitivity of the SnxWyOz films to 2 and 10 ppm concentrations of ammonia at 523 K was 0.35 and 1.17, respectively. At concentrations of 1 and 2 ppm of nitrogen dioxide, the sensitivity was 0.48 and 1.4, respectively, at a temperature of 473 K. At the temperature of 573 K, the sensitivity of 1.3 was obtained for 100 ppm of ethanol. The prepared nanostructured tin-tungsten oxide films showed promising gas-sensitivity, which makes them a good candidate for the manufacturing of gas sensors with high sensitivity and low power consumption.

Gasochromic Properties of Nanostructured Tungsten Oxide Films Prepared by Sputtering Deposition

2007 ◽  
Vol 46 (9B) ◽  
pp. 6315-6318 ◽  
Author(s):  
Katsuyoshi Takano ◽  
Aichi Inouye ◽  
Shunya Yamamoto ◽  
Masaki Sugimoto ◽  
Masahito Yoshikawa ◽  
...  
Keyword(s):  
Tungsten Oxide ◽  
Oxide Films ◽  
Sputtering Deposition
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