Plasma meniscus and extraction electrode studies of the ISIS H− ion source

2010 ◽  
Vol 81 (2) ◽  
pp. 02A707 ◽  
Author(s):  
S. R. Lawrie ◽  
D. C. Faircloth ◽  
A. P. Letchford ◽  
C. Gabor ◽  
J. K. Pozimski
Keyword(s):  
Ion Source ◽  
Extraction Electrode

Extraction Electrode for a 100-kV, 40-A, 10-s Ion Source

1985 ◽  
Vol 7 (2) ◽  
pp. 171-179 ◽  
Author(s):  
Hiroshi Horiike ◽  
Masato Akiba ◽  
Masanori Araki ◽  
Masaaki Kuriyama ◽  
Shinzaburo Matsuda ◽  
...  
Keyword(s):  
Ion Source ◽  
Extraction Electrode

Cooling of extraction electrode of an ion source in long‐pulse operation

1979 ◽  
Vol 50 (11) ◽  
pp. 1453-1457 ◽  
Author(s):  
H. Horiike ◽  
U. Kondoh ◽  
H. Morita ◽  
H. Shirakata ◽  
T. Sugawara ◽  
...  
Keyword(s):  
Ion Source ◽  
Pulse Operation ◽  
Long Pulse ◽  
Extraction Electrode

Hole Geometry Optimization of the Extraction Electrode in a Duopigatron Ion Source

1978 ◽  
Vol 17 (2) ◽  
pp. 423-428 ◽  
Author(s):  
Yoshihiro Ohara ◽  
Shinzaburo Matsuda ◽  
Hirofumi Shirakata ◽  
Shigeru Tanaka
Keyword(s):  
Geometry Optimization ◽  
Ion Source ◽  
Hole Geometry ◽  
Extraction Electrode

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Aspects of high-resolution imaging with a scanning ion microprobe

1986 ◽  
Vol 44 ◽  
pp. 750-751
Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang
Keyword(s):  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Chromatic Aberration ◽  
Ion Source ◽  
Ion Microprobe ◽  
Emission Pattern ◽  
Intrinsic Resolution ◽  
Resolution Imaging ◽  
20 Nm ◽  
Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

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