A novel method to form conducting channels in SiOx(Si) films for field emission application
1995 ◽
Vol 13
(2)
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pp. 478
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Keyword(s):
2008 ◽
Vol 145
(9-10)
◽
pp. 443-446
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Keyword(s):
2010 ◽
Vol 44-47
◽
pp. 2514-2518
2016 ◽
Vol 18
(22)
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pp. 15251-15259
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2013 ◽
Vol 333-335
◽
pp. 1828-1831
2008 ◽
Vol 8
(8)
◽
pp. 4198-4201
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