Mechanism of low‐temperature radiation hardening in alkali halides. I. Single halogen interstitials as the hardening agent at low temperature
Keyword(s):
Keyword(s):
2011 ◽
Vol 2
(2)
◽
pp. 142-145
◽
Keyword(s):
1985 ◽
Vol 15
(6)
◽
pp. 1237-1247
◽
2021 ◽
Vol 64
(2)
◽
pp. 338-342
Keyword(s):