Mechanism of low‐temperature radiation hardening in alkali halides. I. Single halogen interstitials as the hardening agent at low temperature

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pp. 5452-5456 ◽  
Author(s):  
K. Tanimura ◽  
M. Fujiwara ◽  
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T. Hagihara
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V. I. Tovtin ◽  
F. A. Khasanov

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Vol 15 (6) ◽  
pp. 1237-1247 ◽  
Author(s):  
A Audouard ◽  
A Benyagoub ◽  
L Thome ◽  
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Vol 47 (3) ◽  
pp. 83-89 ◽  
Author(s):  
G. A. Kichigina ◽  
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A. I. Mikhailov

Atomic Energy ◽  
2019 ◽  
Vol 126 (1) ◽  
pp. 39-45
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S. I. Porollo ◽  
A. M. Dvoryashin ◽  
A. A. Ivanov ◽  
Yu. V. Konobeev ◽  
S. V. Shulepin

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