The influence of transverse magnetoresistance on Hall‐effect measurements onn‐type germanium and other semiconductors

1977 ◽  
Vol 48 (6) ◽  
pp. 2570-2575 ◽  
Author(s):  
L. D. Partain ◽  
M. R. Lakshminarayana ◽  
C. R. Westgate
Keyword(s):  
Hall Effect ◽  
Transverse Magnetoresistance ◽  
Hall Effect Measurements

Hall Effect and Magnetoresistance in Undoped Poly(3 Hexylthiophene)

1989 ◽  
Vol 173 ◽  
Author(s):  
Azar Assadi ◽  
Christer Svensson ◽  
Magnus Willander
Keyword(s):  
Magnetic Field ◽  
Hall Effect ◽  
Hall Mobility ◽  
Field Effect ◽  
Transverse Magnetic ◽  
Field Effect Mobility ◽  
Transverse Magnetoresistance ◽  
Hall Effect Measurements ◽  
Effect Transistor ◽  
Van Der Pauw

ABSTRACTWe report studies of transport properties of thin films of undoped poly(3-hexylthiophene) (P3HT) fabricated by spinning a polymer solution onto oxidised silicon or glass. The film thicknesseswere on the order of 1000 Å. We studied magnetoresistance, the effect of magnetic field on field effect mobility and Hall effect.Transverse magnetoresistance was measured on films on glass. A positive anomalous magnetoresistance with a saturation value of about 0.1 % was found. Transverse magnetoresistance was also studied by measuring the change of a field effect mobility with magnetic field. This measurement was performed using the field effect transistor structure. An initial mobility of 6.5 × 10−5 cm2/Vs was reduced by about 15 % in a transverse magnetic field.We also carried out Hall effect measurements on films on glass using a Van der Pauw contact configuration. The measured Hall mobility was 2.17 × 10−5 cm2/Vs. Finally we measured the temperature dependence of the Hall mobility and found it follow the exp(T-l/4) law of variable range hopping.

Effect of Cu doping on the electrical Properties of ZnTe by Vacuum Thermal Evaporation

2018 ◽  
Vol 31 (3) ◽  
pp. 20
Author(s):  
Sarmad M. M. Ali ◽  
Alia A.A. Shehab ◽  
Samir A. Maki
Keyword(s):  
Activation Energy ◽  
Electrical Conductivity ◽  
Hall Effect ◽  
Carrier Concentration ◽  
Hall Mobility ◽  
Cu Doping ◽  
Before And After ◽  
Hall Effect Measurements ◽  
Evaporation Technique ◽  
P Type

In this study, the ZnTe thin films were deposited on a glass substrate at a thickness of 400nm using vacuum evaporation technique (2×10-5mbar) at RT. Electrical conductivity and Hall effect measurements have been investigated as a function of variation of the doping ratios (3,5,7%) of the Cu element on the thin ZnTe films. The temperature range of (25-200°C) is to record the electrical conductivity values. The results of the films have two types of transport mechanisms of free carriers with two values of activation energy (Ea1, Ea2), expect 3% Cu. The activation energy (Ea1) increased from 29meV to 157meV before and after doping (Cu at 5%) respectively. The results of Hall effect measurements of ZnTe , ZnTe:Cu films show that all films were (p-type), the carrier concentration (1.1×1020 m-3) , Hall mobility (0.464m2/V.s) for pure ZnTe film, increases the carrier concentration (6.3×1021m-3) Hall mobility (2m2/V.s) for doping (Cu at 3%) film, but  decreases by increasing Cu concentration.

Oxygen diffusion process in a Ba0.96La0.04SnO3thin film on SrTiO3(001) substrate as investigated by time-dependent Hall effect measurements

2015 ◽  
Vol 212 (7) ◽  
pp. 1487-1493 ◽  
Author(s):  
Woong-Jhae Lee ◽  
Hyung Joon Kim ◽  
Egon Sohn ◽  
Hoon Min Kim ◽  
Tai Hoon Kim ◽  
...  
Keyword(s):  
Diffusion Process ◽  
Hall Effect ◽  
Oxygen Diffusion ◽  
Time Dependent ◽  
Hall Effect Measurements

scholarly journals Fractional Quantum Hall Effect Measurements at Zero g Factor

1997 ◽  
Vol 79 (21) ◽  
pp. 4246-4249 ◽  
Author(s):  
D. R. Leadley ◽  
R. J. Nicholas ◽  
D. K. Maude ◽  
A. N. Utjuzh ◽  
J. C. Portal ◽  
...  
Keyword(s):  
Hall Effect ◽  
Quantum Hall Effect ◽  
Quantum Hall ◽  
Fractional Quantum Hall Effect ◽  
Fractional Quantum ◽  
G Factor ◽  
Fractional Quantum Hall ◽  
Hall Effect Measurements

scholarly journals Hall Effect measurements on p-n-p InP structures

2008 ◽  
Vol 38 (1) ◽  
pp. 147-155 ◽  
Author(s):  
C. A. C. Sequeira ◽  
D. M. F. Santos
Keyword(s):  
Hall Effect ◽  
Hall Effect Measurements

Structural, electrical, and optical property studies of indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures

1999 ◽  
Vol 14 (7) ◽  
pp. 2778-2782 ◽  
Author(s):  
M. S. Han ◽  
T. W. Kang ◽  
T. W. Kim
Keyword(s):  
Hall Effect ◽  
Ftir Spectra ◽  
Epitaxial Layers ◽  
High Quality ◽  
Electrical And Optical Properties ◽  
Vacancy Defects ◽  
Transmission Electron ◽  
Hall Effect Measurements ◽  
Transmission Measurements ◽  
Van Der Pauw

Transmission electron microsopy (TEM), Hall effect, and Fourier transform infrared (FTIR) transmission measurements were performed to investigate the structural, electrical, and optical properties of indium-doped Hg0.8Cd0.2Te epitaxial layers grown on Cd0.96Zn0.04Te (211) B substrates by molecular-beam epitaxy. The TEM measurements showed that high-quality Hg0.8Cd0.2Te epitaxial layers with interfacial abruptnesses were grown on the Cd0.96Zn0.04Te substrates. The Van der Pauw Hall effect measurements on typical indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures with a doping concentration of 6 × 1016 cm−3 at 10 K in a magnetic field of 0.5 T yielded a carrier density and a mobility of 2.2 × 1016 cm−3 and 40,000 cm2/V s, respectively. The FTIR spectra showed that the absorption edges of the indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures shifted to a shorter wavelength range than those of the undoped samples, which was caused by the Burstein–Moss effect. The FTIR spectra also showed that the transmittance intensities of the indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures increased compared with those of the undoped heterostructures, which is due to the compensation of the Hg vacancy defects by the indium atoms. These results indicate that the indium-doped Hg0.8Cd0.2Te epitaxial layers were high-quality n-type layers and that p-HgxCd1−xTe epilayers can be grown on indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures for the fabrication of HgxCd1−xTe photoconductors and photodiodes.

Sign in / Sign up

Export Citation Format

Share Document