scholarly journals Erratum: “Effect of gate orientation on dc characteristics of Si-doped, nonpolar AlGaN/GaN metal-oxide semiconductor high electron mobility transistors” [Appl. Phys. Lett. 95, 082110 (2009)]

2009 ◽  
Vol 95 (13) ◽  
pp. 139901
Author(s):  
C. Y. Chang ◽  
Yu-Lin Wang ◽  
B. P. Gila ◽  
A. P. Gerger ◽  
S. J. Pearton ◽  
...  
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