Light‐ion sputtering yields for molybdenum and gold at low energies

1977 ◽  
Vol 48 (11) ◽  
pp. 4722-4728 ◽  
Author(s):  
H. L. Bay ◽  
J. Roth ◽  
J. Bohdansky
Keyword(s):  
Ion Sputtering ◽  
Low Energies ◽  
Sputtering Yields

scholarly journals Measurement of Ion Sputtering Yields for In-depth Profiling Analysis

1991 ◽  
Vol 77 (12) ◽  
pp. 2171-2178 ◽  
Author(s):  
Toshiko SUZUKI ◽  
Kichinosuke HIROKAWA ◽  
Yasuo FUKUDA ◽  
Kenichi SUZUKI ◽  
Satoshi HASHIMOTO ◽  
...  
Keyword(s):  
Depth Profiling ◽  
Ion Sputtering ◽  
Sputtering Yields ◽  
Profiling Analysis

The Surface Behavior of a Binary Alloy During Production by Ion Implantation

1981 ◽  
Vol 7 ◽  
Author(s):  
G. W. Reynolds ◽  
F. R. Vozzo ◽  
R. G. Alias ◽  
A. R. Knudson ◽  
J. M. Lambert ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Nickel Alloys ◽  
Surface Composition ◽  
Target Surface ◽  
Ion Sputtering ◽  
Surface Behavior ◽  
Sputtering Yield ◽  
Sputtering Yields ◽  
State Configuration ◽  
Initial Target

ABSTRACTThin surface copper-nickel alloys were prepared by ion implantation at 90 keV. During the implantation of one pure element by the other the sputtered products were collected on catcher foils at different stages from the beginning of the implant through to the steady state configuration of the target surface. The collector foils and targets were analyzed to determine the behavior of the sputtering yields during implantation and for the change in surface composition at the selected fluence. The total sputtering yield for the target and the effective elemental sputtering yields for each component appear to be functions of the changing surface fractions, the self ion sputtering yield of the implanted species, and the elemental sputtering yield of the initial target species. A model relating these parameters is presented.

Dependence of light-ion sputtering yields of iron on ion fluence and oxygen partial pressure

1980 ◽  
Vol 93-94 ◽  
pp. 645-655 ◽  
Author(s):  
R. Behrisch ◽  
J. Roth ◽  
J. Bohdansky ◽  
A.P. Martinelli ◽  
B. Schweer ◽  
...  
Keyword(s):  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Ion Sputtering ◽  
Sputtering Yields

Measurement of ion sputtering yields for depth profile analyses

1992 ◽  
Vol 18 (8) ◽  
pp. 594-600 ◽  
Author(s):  
Toshiko Suzuki ◽  
Kichinosuke Hirokawa ◽  
Yasuo Fukuda ◽  
Ken-ichi Suzuki ◽  
Satoshi Hashimoto ◽  
...  
Keyword(s):  
Depth Profile ◽  
Ion Sputtering ◽  
Sputtering Yields

An elementary model of neutral and ion sputtering yields

1981 ◽  
Vol 102 (2-3) ◽  
pp. A19
Author(s):  
S.A. Schwarz ◽  
C.R. Helms
Keyword(s):  
Ion Sputtering ◽  
Elementary Model ◽  
Sputtering Yields

Self-ion sputtering yields for copper, nickel, and aluminum

1982 ◽  
Vol 194 (1-3) ◽  
pp. 615-619 ◽  
Author(s):  
R.G. Allas ◽  
A.R. Knudson ◽  
J.M. Lambert ◽  
P.A. Treado ◽  
G.W. Reynolds
Keyword(s):  
Ion Sputtering ◽  
Copper Nickel ◽  
Sputtering Yields
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