Fundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal P3 atomic oxygen

2009 ◽  
Vol 94 (20) ◽  
pp. 204102 ◽  
Author(s):  
Mrunalkumar Chaudhari ◽  
Jincheng Du ◽  
Swayambhu Behera ◽  
Sudha Manandhar ◽  
Sneha Gaddam ◽  
...  
Keyword(s):  
Atomic Oxygen ◽  
Oxygen Plasma ◽  
Organosilicate Materials

Properties of Yttrium Oxide Thin Films on Silicon (100) Prepared by Evaporation of Yttrium in Atomic Oxygen

1994 ◽  
Vol 341 ◽  
Author(s):  
J. Hudner ◽  
H. Ohlsén ◽  
E. Fredriksson
Keyword(s):  
Atomic Oxygen ◽  
Oxygen Plasma ◽  
Rutherford Backscattering Spectrometry ◽  
Thin Layers ◽  
Force Microscopy ◽  
Intermediate Layers ◽  
Activated Reactive Evaporation ◽  
Film Substrate ◽  
Surface Morphologies ◽  
Substrate Temperatures

AbstractThin layers of Y2O3 have been prepared on silicon (100) by an activated reactive evaporation process involving evaporation of metal Y in an atomic oxygen plasma. The presence of the oxygen plasma was found to be crucial for the formation of homogeneous Y2O3 films on Si. The formation of Y2O3 films on Si (100) at different substrate temperatures was investigated. X-ray diffraction analysis showed that Y2O3 films formed between 300 °C and 650 °C were (111) textured while Y2O3 prepared at lower substrate temperatures (80 °C) exhibited mixed orientations. Rutherford backscattering spectrometry indicated that films were stoichiometric. No pronounced channeling was observed in films grown at 350 °C, suggesting polycrystalline film structures. Atomic force microscopy revealed very smooth surface morphologies with average surface roughness < 20 Å for films 700 Å thick deposited at 350 °C. Secondary ion mass spectroscopy indicated the abundance of intermediate layers in the film-substrate interface.

scholarly journals MANIFESTATION OF SOLAR ACTIVITY AND DYNAMICS OF THE ATMOSPHERE IN VARIATIONS OF 577.7 AND 630.0 nm ATMOSPHERIC EMISSIONS IN SOLAR CYCLE 24

2020 ◽  
Vol 6 (3) ◽  
pp. 81-85
Author(s):  
Aleksandr Mikhalev
Keyword(s):  
Solar Activity ◽  
Solar Cycle ◽  
Atomic Oxygen ◽  
Correlation Coefficients ◽  
Atmospheric Emissions ◽  
Annual Average ◽  
Solar Cycle 24 ◽  
Cycle 24 ◽  
Activity Indices

In the paper, variations of the night emission intensities in the 557.7 and 630 nm atomic oxygen lines [OI] in 2011–2019 have been analyzed. The analysis is based on data from the ISTP SB RAS Geophysical Observatory. The emission intensities are compared with atmospheric, solar, and geophysical parameters. High correlation coefficients between monthly average and annual average 630.0 nm emission intensities and solar activity indices F10.7 have been obtained. This suggests a key role of solar activity in variations of this emission in the period of interest. Variations of the 557.7 nm emission demonstrate to a greater extent the correlations of the stratospheric zonal wind (QBO.U30 index) with quasi-biennial oscillations. The causes of the weak dependence of the 557.7 nm emission intensity on solar activity in solar cycle 24 are discussed.

A Magnetically Filtered Atomic Oxygen Plasma Source for Low-Earth-Orbit Simulation

2021 ◽  
pp. 1-10
Author(s):  
Carlos A. Maldonado ◽  
Andrew D. Ketsdever ◽  
John D. Williams
Keyword(s):  
Atomic Oxygen ◽  
Oxygen Plasma ◽  
Plasma Source ◽  
Low Earth Orbit ◽  
Earth Orbit

Role of atomic oxygen produced by ECR plasma in the oxidation of YBa2Cu3O7-Xthin films studied by in-situ resistivity measurement

1991 ◽  
Vol 4 (1S) ◽  
pp. S382-S384
Author(s):  
K Yamamoto ◽  
B M Liarson ◽  
C B Eom ◽  
R H Hammond ◽  
J C Bravman ◽  
...  
Keyword(s):  
Atomic Oxygen ◽  
Resistivity Measurement ◽  
Ecr Plasma

The Effect of Oxygen Plasma on Some Experimental Polymers Containing Silicon and Phosphorus

1993 ◽  
Vol 11 (2) ◽  
pp. 137-146 ◽  
Author(s):  
J.W. Connell ◽  
J.G. Smith ◽  
P.M. Hergenrother
Keyword(s):  
Weight Loss ◽  
High Performance ◽  
Atomic Oxygen ◽  
Oxygen Plasma ◽  
Weight Retention ◽  
Flame Resistance ◽  
Space Applications ◽  
Thermosetting Resins ◽  
Limiting Oxygen Index ◽  
Arylene Ether

As part of a NASA program on high performance polymers for space applications, polymers containing silicon and phosphorus were prepared, characterized and exposed to an oxygen plasma under vacuum. Thin films of polyimides containing pendent siloxane groups, thermosetting resins contain ing silicon and poly(arylene ether)s containing phenylphosphine oxide were ex posed to a radio frequency generated oxygen plasma to assess their stability. The weight loss of the films was monitored as a function of exposure time and compared with that of Ultem® and Kapton® polyimide films of the same thick ness exposed under identical conditions. All of the experimental materials ex hibited better weight retention than either of the commercial polyimides. The thermosetting resins containing silicon and poly(arylene ether)s containing phosphine oxide exhibited only minor weight loss (0-5%) compared to that ex hibited by Ultem® (75-100%) and Kapton® (35-82%). Organic polymers con taining silicon are known to form silicates and silicon dioxide when exposed to atomic oxygen providing an in situ protective coating. Likewise, polymers con taining phosphorus have been shown to form an inorganic phosphate surface layer which subsequently provides protection from further oxidation. The same inherent characteristics that provide the polymers with atomic oxygen resis tance (i.e., high oxidation state or inorganic oxide formation) may also impart fire resistance. Materials containing phosphorus are known to exhibit good flame resistance. The chemistry, properties, limiting oxygen index and oxygen plasma resistance of these materials will be discussed.

On the role of adsorbed atomic oxygen and CO2 in copper based methanol synthesis catalysts

1994 ◽  
Vol 25 (1-2) ◽  
pp. 1-10 ◽  
Author(s):  
Martin Muhler ◽  
Eric T�rnqvist ◽  
Lars P. Nielsen ◽  
Bjerne S. Clausen ◽  
Henrik Tops�e
Keyword(s):  
Methanol Synthesis ◽  
Atomic Oxygen ◽  
Synthesis Catalysts ◽  
Methanol Synthesis Catalysts

ROLE OF O2(a' Δ) IN THE OXYGEN PLASMA

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-135-C7-136
Author(s):  
J. W. Dettmer ◽  
A. Garscadden
Keyword(s):  
Oxygen Plasma

Characterization of an Atomic Oxygen Plasma Source for Ground-Based Simulation of the LEO Neutral Environment

2013 ◽  
Author(s):  
Carlos A. Maldonado ◽  
Andrew Ketsdever ◽  
Lauren P. Rand ◽  
Kan Xie ◽  
Casey Farnell ◽  
...  
Keyword(s):  
Atomic Oxygen ◽  
Oxygen Plasma ◽  
Plasma Source
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