Understanding pressure-induced phase-transformation behavior in silicon through in situ electrical probing under cyclic loading conditions

2009 ◽  
Vol 105 (10) ◽  
pp. 106111 ◽  
Author(s):  
N. Fujisawa ◽  
S. Ruffell ◽  
J. E. Bradby ◽  
J. S. Williams ◽  
B. Haberl ◽  
...  
2011 ◽  
Vol 158 (8) ◽  
pp. A890 ◽  
Author(s):  
Kevin Rhodes ◽  
Roberta Meisner ◽  
Yoongu Kim ◽  
Nancy Dudney ◽  
Claus Daniel

ChemSusChem ◽  
2019 ◽  
Vol 12 (10) ◽  
pp. 2240-2250 ◽  
Author(s):  
Lea de Biasi ◽  
Alexander Schiele ◽  
Maria Roca‐Ayats ◽  
Grecia Garcia ◽  
Torsten Brezesinski ◽  
...  

2021 ◽  
Vol 806 ◽  
pp. 140860
Author(s):  
Di Xie ◽  
Zongyang Lyu ◽  
Yuan Li ◽  
Peter K. Liaw ◽  
Huck Beng Chew ◽  
...  

2003 ◽  
Vol 795 ◽  
Author(s):  
Jae-il Jang ◽  
Songqing Wen ◽  
M. J. Lance ◽  
I. M. Anderson ◽  
G. M. Pharr

ABSTRACTNanoindentation experiments were performed on single crystals of (100) Si using a series of triangular pyramidal indenters with centerline-to-face angles in the range 35.3° to 85.0°. The influences of the indenter geometry on cracking and phase transformation during indentation were systematically studied. Although reducing the indenter angle reduces the threshold load for cracking and increases the crack lengths, c, at a given indention load, P, the frequently observed relation between P and c3/2 is maintained for all of the indenters over a wide range of load. Features in the nanoindentation load-displacement curves in conjunction with Raman spectroscopy of the crystalline and amorphous phases in and around the contact impression show that the indenter geometry also plays a role in the phase transformation behavior. Results are discussed in relation to prevailing ideas about indentation cracking and phase transformation in silicon.


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