Annealing behavior of atomic layer deposited HfO2 films studied by synchrotron x-ray reflectivity and grazing incidence small angle scattering
Keyword(s):
X Ray
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2020 ◽
Vol 53
(1)
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pp. 262-276
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1988 ◽
Vol 97
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pp. 227-230
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1977 ◽
Vol 10
(1)
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pp. 37-44
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Keyword(s):