Interrogating Molecular-Ion Beams by Ultrashort Intense Laser Pulses

2009 ◽  
Author(s):  
I. Ben-Itzhak ◽  
J. McKenna ◽  
A. M. Sayler ◽  
B. Gaire ◽  
Nora G. Johnson ◽  
...  
Keyword(s):  
Laser Pulses ◽  
Ion Beams ◽  
Intense Laser ◽  
Molecular Ion ◽  
Intense Laser Pulses

scholarly journals Ionization and dissociation of molecular ion beams caused by ultrashort intense laser pulses

2007 ◽  
Vol 88 ◽  
pp. 012046 ◽  
Author(s):  
I Ben-Itzhak ◽  
A M Sayler ◽  
P Q Wang ◽  
J McKenna ◽  
B Gaire ◽  
...  
Keyword(s):  
Laser Pulses ◽  
Ion Beams ◽  
Intense Laser ◽  
Molecular Ion ◽  
Intense Laser Pulses

scholarly journals Reducing ion energy spread in hole-boring radiation pressure acceleration by using two-ion-species targets

2015 ◽  
Vol 33 (1) ◽  
pp. 103-107 ◽  
Author(s):  
S. M. Weng ◽  
M. Murakami ◽  
Z. M. Sheng
Keyword(s):  
Radiation Pressure ◽  
Laser Pulses ◽  
Ion Beams ◽  
Energy Spread ◽  
Intense Laser ◽  
Ion Energy ◽  
Fast Ions ◽  
Intense Laser Pulses ◽  
Fast Ion ◽  
Ion Species

AbstractThe generation of fast ion beams in the hole-boring radiation pressure acceleration by intense laser pulses has been studied for targets with different ion components. We find that the oscillation of the longitudinal electric field for accelerating ions can be effectively suppressed by using a two-ion-species target, because fast ions from a two-ion-species target are distributed into more bunches and each bunch bears less charge. Consequently, the energy spread of ion beams generated in the hole-boring radiation pressure acceleration can be greatly reduced down to 3.7% according to our numerical simulation.

scholarly journals Generation of high-energy mono-energetic heavy ion beams by radiation pressure acceleration of ultra-intense laser pulses

2014 ◽  
Vol 21 (12) ◽  
pp. 123118 ◽  
Author(s):  
D. Wu ◽  
B. Qiao ◽  
C. McGuffey ◽  
X. T. He ◽  
F. N. Beg
Keyword(s):  
Radiation Pressure ◽  
Laser Pulses ◽  
Heavy Ion ◽  
High Energy ◽  
Ion Beams ◽  
Intense Laser ◽  
Intense Laser Pulses

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

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