X-ray photoelectron spectroscopic study of Ge2Sb2Te5 etched by fluorocarbon inductively coupled plasmas

2008 ◽  
Vol 93 (4) ◽  
pp. 043126 ◽  
Author(s):  
S.-K. Kang ◽  
J. S. Oh ◽  
B. J. Park ◽  
S. W. Kim ◽  
J. T. Lim ◽  
...  
Keyword(s):  
Spectroscopic Study ◽  
Inductively Coupled Plasmas ◽  
X Ray ◽  
Inductively Coupled ◽  
Coupled Plasmas

scholarly journals Analysis of Perovskite Oxides Etching Using Argon Inductively Coupled Plasmas for Photonics Applications

2020 ◽  
Author(s):  
Guanyu Chen ◽  
Eric Jun Hao Cheung ◽  
Yu Cao ◽  
Jisheng Pan ◽  
Aaron J. Danner
Keyword(s):  
Photoelectron Spectroscopy ◽  
Perovskite Oxides ◽  
Inductively Coupled Plasmas ◽  
Barium Titanium Oxide ◽  
X Ray ◽  
Force Microscopy ◽  
Inductively Coupled ◽  
Icp Etching ◽  
Atomic Force ◽  
Coupled Plasmas

Abstract We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatable and can be applied to other perovskite oxides, such as X-cut LN and barium titanium oxide (BTO). The surface roughness is better for both etched LN and BTO compared with their as-deposited counterparts as confirmed by atomic force microscopy (AFM). Both the energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) methods have been used for surface chemical component comparisons, qualitative and quantitative, and no obvious surface state changes are observed according to the measured results. An optical waveguide fabricated with the optimized argon-based ICP etching was measured to have -3.7 dB/cm loss near 1550 nm wavelength for Z-cut LN, which validates this kind of method for perovskite oxides etching in photonics applications.

scholarly journals Analysis of perovskite oxides etching using argon inductively coupled plasmas for photonics applications

2021 ◽  
Author(s):  
Guanyu Chen ◽  
Eric Jun Hao Cheung ◽  
Yu Cao ◽  
Jisheng Pan ◽  
Aaron J. Danner
Keyword(s):  
Photoelectron Spectroscopy ◽  
Perovskite Oxides ◽  
Inductively Coupled Plasmas ◽  
Barium Titanium Oxide ◽  
X Ray ◽  
Force Microscopy ◽  
Inductively Coupled ◽  
Icp Etching ◽  
Atomic Force ◽  
Coupled Plasmas

Abstract We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatable and can be applied to other perovskite oxides, such as X-cut LN and barium titanium oxide (BTO). The surface roughness is better for both etched LN and BTO compared with their as-deposited counterparts as confirmed by atomic force microscopy (AFM). Both the energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) methods have been used for surface chemical component comparisons, qualitative and quantitative, and no obvious surface state changes are observed according to the measured results. An optical waveguide fabricated with the optimized argon-based ICP etching was measured to have − 3.7 dB/cm loss near 1550 nm wavelength for Z-cut LN, which validates this kind of method for perovskite oxides etching in photonics applications.

scholarly journals Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications

2021 ◽  
Vol 16 (1) ◽  
Author(s):  
Guanyu Chen ◽  
Eric Jun Hao Cheung ◽  
Yu Cao ◽  
Jisheng Pan ◽  
Aaron J. Danner
Keyword(s):  
Photoelectron Spectroscopy ◽  
Perovskite Oxides ◽  
Perovskite Oxide ◽  
Inductively Coupled Plasmas ◽  
Barium Titanium Oxide ◽  
X Ray ◽  
Force Microscopy ◽  
Inductively Coupled ◽  
Icp Etching ◽  
Coupled Plasmas

AbstractWe analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatable and can be applied to other perovskite oxides, such as X-cut LN and barium titanium oxide (BTO). The surface roughness is better for both etched LN and BTO compared with their as-deposited counterparts as confirmed by atomic force microscopy (AFM). Both the energy-dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) methods have been used for surface chemical component comparisons, qualitative and quantitative, and no obvious surface state changes are observed according to the measured results. An optical waveguide fabricated with the optimized argon-based ICP etching was measured to have -3.7 dB/cm loss near 1550 nm wavelength for Z-cut LN, which validates this kind of method for perovskite oxides etching in photonics applications.

scholarly journals Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]

2020 ◽  
Vol 128 (8) ◽  
pp. 089901
Author(s):  
Chenhui Qu ◽  
Steven J. Lanham ◽  
Steven C. Shannon ◽  
Sang Ki Nam ◽  
Mark J. Kushner
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Power Matching ◽  
Coupled Plasmas

Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

2006 ◽  
Vol 83 (2) ◽  
pp. 328-335 ◽  
Author(s):  
S.W. Na ◽  
M.H. Shin ◽  
Y.M. Chung ◽  
J.G. Han ◽  
S.H. Jeung ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

scholarly journals Nonlinear electromagnetic fields in 0.5 MHz inductively coupled plasmas

2003 ◽  
Vol 10 (4) ◽  
pp. 1146-1151 ◽  
Author(s):  
K. Ostrikov ◽  
E. Tsakadze ◽  
S. Xu ◽  
S. V. Vladimirov ◽  
R. Storer
Keyword(s):  
Electromagnetic Fields ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Inductively Coupled Plasmas

1974 ◽  
Vol 46 (13) ◽  
pp. 1155A-1162A ◽  
Author(s):  
Velmer A. Fassel ◽  
Richard N. Kniseley
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas
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