Effect of preplasma on energetic electron and ion generation by irradiation of ultra-intense laser pulses

Author(s):  
Tatsufumi Nakamura ◽  
Hideo Nagatomo ◽  
Kunioki Mima ◽  
Sergei V. Bulanov ◽  
H. Daido
2010 ◽  
Vol 50 (5) ◽  
pp. 055006 ◽  
Author(s):  
T. Matsuoka ◽  
S. Reed ◽  
C. McGuffey ◽  
S.S. Bulanov ◽  
F. Dollar ◽  
...  

2012 ◽  
Vol 78 (4) ◽  
pp. 461-468 ◽  
Author(s):  
WEI-MIN WANG ◽  
ZHENG-MING SHENG ◽  
SHIGEO KAWATA ◽  
CHUN-YANG ZHENG ◽  
YU-TONG LI ◽  
...  

AbstractEnergetic electron beam generation from a thin foil target by the ponderomotive force of an ultra-intense circularly polarized laser pulse is investigated. Two-dimensional particle-in-cell (PIC) simulations show that laser pulses with intensity of 1022–1023 Wcm−2 generate about 1–10 GeV electron beams, in agreement with the prediction of one-dimensional theory. When the laser intensity is at 1024–1025 Wcm−2, the beam energy obtained from PIC simulations is lower than the values predicted by the theory. The radiation damping effect is considered, which is found to become important for the laser intensity higher than 1025 Wcm−2. The effect of laser focus positions is also discussed.


2009 ◽  
Vol 16 (4) ◽  
pp. 043106 ◽  
Author(s):  
Sizhong Wu ◽  
Zhanjun Liu ◽  
Cangtao Zhou ◽  
Shaoping Zhu

Author(s):  
S. Ter-Avetisyan ◽  
M. Schnurer ◽  
S. Busch ◽  
H. Stiel ◽  
M.P. Kalachnikov ◽  
...  

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.


2012 ◽  
Vol 137 (4) ◽  
pp. 044112 ◽  
Author(s):  
Mohsen Vafaee ◽  
Firoozeh Sami ◽  
Babak Shokri ◽  
Behnaz Buzari ◽  
Hassan Sabzyan

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