Soft X-ray Spectra Analysis in a High-Current Z-Pinch

1994 ◽  
Author(s):  
F. B. Rosmej ◽  
O. N. Rosmej ◽  
S. A. Komarov ◽  
V. O. Mishensky ◽  
J. G. Utjugov ◽  
...  
Keyword(s):  
High Current ◽  
Spectra Analysis ◽  
X Ray ◽  
Z Pinch

On prospects of powerful SXR pulse generation on “Gamma 4” facility

2014 ◽  
Vol 32 ◽  
pp. 1460335 ◽  
Author(s):  
V. S. Gordeev ◽  
A. V. Grishin ◽  
A. P. Orlov ◽  
A. L. Mozgovoy ◽  
B. G. Repin ◽  
...  
Keyword(s):  
Electron Accelerator ◽  
Boundary Energy ◽  
Output Pulse ◽  
Pulse Generation ◽  
High Current ◽  
Radiation Physics ◽  
X Ray ◽  
Radiation Output ◽  
Z Pinch ◽  
Diode Current

RFNC-VNIIEF is creating a multi-module multi-terawatt electro-physical facility “Gamma”, intended for research in the field of radiation physics. Up to now RFNC-VNIIEF created the first module of the facility – a high-current pulsed electron accelerator “Gamma-1”, having the following parameters: boundary energy of the electrons of ≤ 2.0 MeV, diode current of 0.75 MA, maximum electric power of 1.5 TW. Creation of the 4-module variant of the facility (Gamma-4) is the next stage of the work. This paper presents calculation research of expected characteristics of soft x-ray radiation output pulse at “Gamma-4” facility operation into a common load (Z-pinch).

Spatial resolution of X-ray microanalysis in thin foils

1978 ◽  
Vol 36 (1) ◽  
pp. 544-545
Author(s):  
R. Hutchings ◽  
I.P. Jones ◽  
M.H. Loretto ◽  
R.E. Smallman
Keyword(s):  
Spatial Resolution ◽  
Electron Probe ◽  
Beam Divergence ◽  
Inelastic Interaction ◽  
Specimen Thickness ◽  
High Current ◽  
Beam Spreading ◽  
X Ray ◽  
Thin Foils ◽  
Complex Calculation

There is increasing interest in X-ray microanalysis of thin specimens and the present paper attempts to define some of the factors which govern the spatial resolution of this type of microanalysis. One of these factors is the spreading of the electron probe as it is transmitted through the specimen. There will always be some beam-spreading with small electron probes, because of the inevitable beam divergence associated with small, high current probes; a lower limit to the spatial resolution is thus 2αst where 2αs is the beam divergence and t the specimen thickness.In addition there will of course be beam spreading caused by elastic and inelastic interaction between the electron beam and the specimen. The angle through which electrons are scattered by the various scattering processes can vary from zero to 180° and it is clearly a very complex calculation to determine the effective size of the beam as it propagates through the specimen.

Influence of High Current Pulsed Electron Beam Irradiation on Ni-P Electroless Plating

2011 ◽  
Vol 299-300 ◽  
pp. 77-81
Author(s):  
Yang Xu ◽  
Sheng Zhi Hao ◽  
Xiang Dong Zhang ◽  
Min Cai Li ◽  
Chuang Dong
Keyword(s):  
Electroless Plating ◽  
Electron Beam Irradiation ◽  
Xrd Analysis ◽  
High Current ◽  
X Ray Diffraction ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
6063 Aluminum Alloy ◽  
Pre Treatment ◽  
Better Than

The surface irradiation of 6063 aluminum alloy by high current pulsed electron was conducted with the aim of replacing the complicated pre-treatment in the processes of electroless plating. To explore the microstructure changes, optical metallography, SEM (scanning electron microscope), XRD (X-ray diffraction) analyses were carried out, and the sliding tests were used for the detection of wear resistance. It was concluded that the HCPEB irradiation could replace the pre-treatment of aluminum substrate as required in conventional electroless plating with a decreased surface roughness of Ni-P alloy plating layer. The plates exhibited an amorphous microstructure as demonstrated by XRD analysis. The plates, produced with the routine of HCPEB irradiation, activation and electroless plating possess, also exhibited good quality, even better than that of conventional electroless plating technique.

A Compact High Current Generator for X-Ray Radiography

2005 ◽  
Author(s):  
B.M. Kovalchuk ◽  
A.V. Kharlov ◽  
V.B. Zorin
Keyword(s):  
High Current ◽  
Current Generator ◽  
X Ray

X-ray backlight imaging in Z-pinch

2012 ◽  
Vol 684 ◽  
pp. 93-96
Author(s):  
Lifeng Liu ◽  
Shali Xiao ◽  
Jiayu Qian ◽  
Xianbin Huang ◽  
Hongchun Cai
Keyword(s):  
X Ray ◽  
Z Pinch

scholarly journals X-ray and Ion Emission Sources in High-current Discharge Plasma

2015 ◽  
Vol 71 ◽  
pp. 146-149 ◽  
Author(s):  
A.V. Balovnev ◽  
E.D. Vovchenko ◽  
I.G. Grigoryeva ◽  
E.I. Dodulad ◽  
A.S. Savelov ◽  
...  
Keyword(s):  
Discharge Plasma ◽  
Emission Sources ◽  
High Current ◽  
Current Discharge ◽  
X Ray ◽  
High Current Discharge ◽  
Ion Emission

Temperature behavior of X-Ray luminescence spectra of ZnSe

2022 ◽  
Author(s):  
I. Abbasov ◽  
M. Musayev ◽  
D. Askerov ◽  
J. Huseynov ◽  
E. Gavrishuk ◽  
...  
Keyword(s):  
Thermal Quenching ◽  
Chemical Vapor ◽  
Temperature Behavior ◽  
Luminescence Spectra ◽  
Uv Laser ◽  
Green Band ◽  
Spectra Analysis ◽  
X Ray ◽  
Temperature Dependences ◽  
The Given

In the given paper, the temperature dependences ([Formula: see text]–300 K) of the green band intensity at wavelengths [Formula: see text] nm and [Formula: see text] nm have been measured and observed, respectively, from the polished and unpolished surface (PS and unPS) of a polycrystalline CVD (chemical vapor deposition) ZnSe sample upon excitation by X-ray quanta ([Formula: see text]. In both cases, the activation energy of thermal quenching has been determined, and the reasons for thermal quenching have been considered in detail. Along with XRL spectra analysis, the temperature behavior of the green band observed upon excitation by an ultraviolet (UV) laser (He–Cd, [Formula: see text] nm) from the PS and unPS in the temperature range [Formula: see text]–200 K has been discussed in more detail.

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