Self-gravitating rotating anisotropic pressure plasma in presence of Hall current and electrical resistivity using generalized polytrope laws

2008 ◽  
Vol 15 (6) ◽  
pp. 062108 ◽  
Author(s):  
R. P. Prajapati ◽  
G. D. Soni ◽  
R. K. Chhajlani
Keyword(s):  
Electrical Resistivity ◽  
Hall Current ◽  
Anisotropic Pressure ◽  
Pressure Plasma

Anisotropic pressure effect on the electrical resistivity of CeRu2Al10

2012 ◽  
Vol 86 (8) ◽  
Author(s):  
H. Tanida ◽  
Y. Nonaka ◽  
D. Tanaka ◽  
M. Sera ◽  
T. Nishioka ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Pressure Effect ◽  
Anisotropic Pressure

Magnetogravitational instability of a rotating anisotropic plasma with finite-ion-Larmor-radius corrections and generalized polytropic laws

1998 ◽  
Vol 60 (4) ◽  
pp. 673-694 ◽  
Author(s):  
G. D. SONI ◽  
R. K. CHHAJLANI
Keyword(s):  
Magnetic Field ◽  
Electrical Resistivity ◽  
Dispersion Relation ◽  
Normal Mode Analysis ◽  
Transverse Mode ◽  
Mode Analysis ◽  
Larmor Radius ◽  
Anisotropic Pressure ◽  
Axis Of Rotation ◽  
The Magnetic Field

The gravitational instability of an infinite homogeneous, finitely conducting, rotating, collisionless, anisotropic-pressure plasma in the presence of a uniform magnetic field with finite-ion-Larmor-radius (FLR) corrections and generalized polytropic laws is investigated. The polytropic laws are considered for the pressure components in directions parallel and perpendicular to the magnetic field. The method of normal-mode analysis is applied to derive the dispersion relation. Wave propagation is considered for both parallel and perpendicular axes of rotation. Longitudinal and transverse modes of propagation are discussed separately. The effects of rotation, finite electrical resistivity, FLR corrections and polytropic indices on the gravitational, firehose and mirror instabilities are discussed. The stability of the system is discussed by applying the Routh–Hurwitz criterion. Extensive numerical treatment of the dispersion relation leads to several interesting results. For the transverse mode of propagation with the axis of rotation parallel to the magnetic field, it is observed that rotation stabilizes the system by decreasing the critical Jeans wavenumber. It is also seen that the region of instability and the value of the critical Jeans wavenumber are larger for the Chew–Goldberger–Low (CGL) set of equations in comparison with the magnetohydrodynamic (MHD) set of equations. It is found that the effect of FLR corrections is significant only in the low-wavelength range, and produces a stabilizing influence. For the transverse mode of propagation with the axis of rotation parallel to the magnetic field, the finite electrical resistivity removes the polytropic index [nu] from the condition for instability. The inclusion of rotation alone or FLR corrections alone or both together does not affect the condition for mirror instability. The growth rate of the mirror instability is modified owing to uniform rotation or FLR corrections or both together. We note that the condition of mirror instability depends upon the polytropic indices. We also note that neither the mirror instability nor the firehose instability can be observed for the isotropic MHD set of equations.

On the Rayleigh—Taylor instability in hydromagnetics with finite electrical resistivity and Hall current

1969 ◽  
Vol 3 (4) ◽  
pp. 633-642 ◽  
Author(s):  
Surindar Singh ◽  
J. N. Tandon
Keyword(s):  
Magnetic Field ◽  
Electrical Resistivity ◽  
Hall Current ◽  
Incompressible Fluids ◽  
Taylor Instability ◽  
High Resistivity ◽  
Horizontal Magnetic Field ◽  
Low Resistivity ◽  
Rayleigh Taylor Instability

The effect of Hall current and finite electrical resistivity has been studied on the Rayleigh—Taylor instability of superposed incompressible fluids in the presence of a uniform horizontal magnetic field. It is found that Hall current has a negligible stabilizing influence in the high resistivity limit whereas it has a destabilizing influence in the low resistivity limit.

scholarly journals Gravitational Instability of Rotating Viscoelastic Partially Ionized Plasma in the Presence of an Oblique Magnetic Field and Hall Current

2011 ◽  
Vol 2011 ◽  
pp. 1-8 ◽  
Author(s):  
M. F. El-Sayed ◽  
R. A. Mohamed
Keyword(s):  
Magnetic Field ◽  
Electrical Resistivity ◽  
Hall Current ◽  
Gravitational Instability ◽  
Angular Frequency ◽  
Physical Parameters ◽  
Physical Effects ◽  
Partially Ionized ◽  
The Magnetic Field ◽  
Oblique Magnetic Field

The gravitational instability of a rotating Walters B′ viscoelastic partially ionized plasma permeated by an oblique magnetic field has been investigated in the presence of the effects of Hall currents, electrical resistivity, and ion viscosity. The dispersion relation and numerical calculations have been performed to obtain the dependence of the growth rate of the gravitational unstable mode on the various physical effects. It is found that viscosity and collision frequency of plasma have stabilizing effects, while viscoelasticity and angular frequency of rotation have destabilizing effect; the electrical resistivity has a destabilizing effect only for small wavenumbers; the density of neutral particles and the magnetic field component in z-direction have stabilizing effects for wavenumbers ranges k<5 and k<10, respectively; the Hall current has a slightly destabilizing effect. Finally, the inclination angle to z-direction has a destabilizing effect to all physical parameters.

In-situ electrical-resistivity measurements in the high-voltage electron microscope

1978 ◽  
Vol 36 (1) ◽  
pp. 68-69
Author(s):  
W. E. King
Keyword(s):  
Electrical Resistivity ◽  
Electron Microscope ◽  
High Voltage ◽  
Resistivity Measurements ◽  
Voltage Electron ◽  
High Voltage Electron Microscope ◽  
High Voltage Electron ◽  
Wide Range ◽  
Helium Gas

A side-entry type, helium-temperature specimen stage that has the capability of in-situ electrical-resistivity measurements has been designed and developed for use in the AEI-EM7 1200-kV electron microscope at Argonne National Laboratory. The electrical-resistivity measurements complement the high-voltage electron microscope (HVEM) to yield a unique opportunity to investigate defect production in metals by electron irradiation over a wide range of defect concentrations.A flow cryostat that uses helium gas as a coolant is employed to attain and maintain any specified temperature between 10 and 300 K. The helium gas coolant eliminates the vibrations that arise from boiling liquid helium and the temperature instabilities due to alternating heat-transfer mechanisms in the two-phase temperature regime (4.215 K). Figure 1 shows a schematic view of the liquid/gaseous helium transfer system. A liquid-gas mixture can be used for fast cooldown. The cold tip of the transfer tube is inserted coincident with the tilt axis of the specimen stage, and the end of the coolant flow tube is positioned without contact within the heat exchanger of the copper specimen block (Fig. 2).

The stabilization of B.C.C. Cu in Cu/Nb nanolayered composites

1996 ◽  
Vol 54 ◽  
pp. 228-229
Author(s):  
H. Kung ◽  
A.J. Griffin ◽  
Y.C. Lu ◽  
K.E. Sickafus ◽  
T.E. Mitchell ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Layer Thickness ◽  
Volume Fraction ◽  
Ion Beam ◽  
High Strength ◽  
Cross Sectional ◽  
Metastable Structure ◽  
High Resolution Tem ◽  
Potential Improvement ◽  
Two Phases

Materials with compositionally modulated structures have gained much attention recently due to potential improvement in electrical, magnetic and mechanical properties. Specifically, Cu-Nb laminate systems have been extensively studied mainly due to the combination of high strength, and superior thermal and electrical conductivity that can be obtained and optimized for the different applications. The effect of layer thickness on the hardness, residual stress and electrical resistivity has been investigated. In general, increases in hardness and electrical resistivity have been observed with decreasing layer thickness. In addition, reduction in structural scale has caused the formation of a metastable structure which exhibits uniquely different properties. In this study, we report the formation of b.c.c. Cu in highly textured Cu/Nb nanolayers. A series of Cu/Nb nanolayered films, with alternating Cu and Nb layers, were prepared by dc magnetron sputtering onto Si {100} wafers. The nominal total thickness of each layered film was 1 μm. The layer thickness was varied between 1 nm and 500 nm with the volume fraction of the two phases kept constant at 50%. The deposition rates and film densities were determined through a combination of profilometry and ion beam analysis techniques. Cross-sectional transmission electron microscopy (XTEM) was used to examine the structure, phase and grain size distribution of the as-sputtered films. A JEOL 3000F high resolution TEM was used to characterize the microstructure.

Chemical structure of diamond-like carbon thin films

1990 ◽  
Vol 48 (4) ◽  
pp. 710-711
Author(s):  
N.-H. Cho ◽  
K.M. Krishnan ◽  
D.B. Bogy
Keyword(s):  
Electrical Resistivity ◽  
Chemical Structure ◽  
Diamond Like Carbon ◽  
Chemical Structures ◽  
Sputtering Power ◽  
Data Aquisition ◽  
Equilibrium Phases ◽  
Electron Energy Loss ◽  
Power Densities ◽  
Preparation Techniques

Diamond-like carbon (DLC) films have attracted much attention due to their useful properties and applications. These properties are quite variable depending on film preparation techniques and conditions, DLC is a metastable state formed from highly non-equilibrium phases during the condensation of ionized particles. The nature of the films is therefore strongly dependent on their particular chemical structures. In this study, electron energy loss spectroscopy (EELS) was used to investigate how the chemical bonding configurations of DLC films vary as a function of sputtering power densities. The electrical resistivity of the films was determined, and related to their chemical structure.DLC films with a thickness of about 300Å were prepared at 0.1, 1.1, 2.1, and 10.0 watts/cm2, respectively, on NaCl substrates by d.c. magnetron sputtering. EEL spectra were obtained from diamond, graphite, and the films using a JEOL 200 CX electron microscope operating at 200 kV. A Gatan parallel EEL spectrometer and a Kevex data aquisition system were used to analyze the energy distribution of transmitted electrons. The electrical resistivity of the films was measured by the four point probe method.

Sign in / Sign up

Export Citation Format

Share Document