Inhibition of fast electron energy deposition due to preplasma filling of cone-attached targets

2008 ◽  
Vol 15 (4) ◽  
pp. 042706 ◽  
Author(s):  
S. D. Baton ◽  
M. Koenig ◽  
J. Fuchs ◽  
A. Benuzzi-Mounaix ◽  
P. Guillou ◽  
...  
Keyword(s):  
Electron Energy ◽  
Fast Electron ◽  
Energy Deposition

scholarly journals Enhancement of fast electron energy deposition by external magnetic fields

2016 ◽  
Vol 688 ◽  
pp. 012033 ◽  
Author(s):  
J J Honrubia ◽  
M Murakami ◽  
K Mima ◽  
T Johzaki ◽  
A Sunahara ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Electron Energy ◽  
Fast Electron ◽  
Energy Deposition

Fast electron energy deposition in aluminium foils: Resistive vs. drag heating

2009 ◽  
Vol 175 (1) ◽  
pp. 71-76 ◽  
Author(s):  
J. J. Santos ◽  
A. Debayle ◽  
Ph. Nicolaï ◽  
V. Tikhonchuk ◽  
M. Manclossi ◽  
...  
Keyword(s):  
Electron Energy ◽  
Fast Electron ◽  
Energy Deposition

Strong shock generation by fast electron energy deposition

2013 ◽  
Vol 20 (12) ◽  
pp. 122707 ◽  
Author(s):  
T. E. Fox ◽  
A. P. L. Robinson ◽  
J. Pasley
Keyword(s):  
Electron Energy ◽  
Fast Electron ◽  
Energy Deposition ◽  
Strong Shock ◽  
Shock Generation

Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Distribution ◽  
Electron Energy ◽  
Electron Beam Lithography ◽  
Energy Deposition ◽  
Si Substrate ◽  
Positive Resist

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

Electron energy deposition in a gaseous mixture

1973 ◽  
Vol 5 (4) ◽  
pp. 239-262 ◽  
Author(s):  
L.R. Peterson ◽  
T. Sawada ◽  
J.N. Bass ◽  
A.E.S. Green
Keyword(s):  
Electron Energy ◽  
Energy Deposition ◽  
Gaseous Mixture

Electron energy deposition in N2 gas

1988 ◽  
Vol 36 (4) ◽  
pp. 329-352 ◽  
Author(s):  
J.L. Fox ◽  
G.A. Victor
Keyword(s):  
Electron Energy ◽  
Energy Deposition
Sign in / Sign up

Export Citation Format

Share Document