Topological analysis of electron densities from Kohn-Sham and subsystem density functional theory

2008 ◽  
Vol 128 (4) ◽  
pp. 044114 ◽  
Author(s):  
Karin Kiewisch ◽  
Georg Eickerling ◽  
Markus Reiher ◽  
Johannes Neugebauer
2018 ◽  
Vol 24 (S1) ◽  
pp. 116-117
Author(s):  
Mark P. Oxley ◽  
Axiel Yael Birenbaum ◽  
Tribhuwan Pandey ◽  
Valentino R. Cooper ◽  
Miaofang Chi

1996 ◽  
Vol 74 (6) ◽  
pp. 1014-1020 ◽  
Author(s):  
Yosslen Aray ◽  
Jesús Rodríguez

Molecular orbital ab initio Hartree–Fock, post-Hartree–Fock at the MP2 and QCISD levels, and density functional theory calculations of the dipole moment, the topology of the electronic density, ρ(r), and its Laplacian, [Formula: see text], for CO and NO molecules are reported. The results obtained confirm that density functional methods provide remarkably good electronic properties and a good description of the topology of ρ(r) and [Formula: see text]. The Becke exchange functional with the correlation functional of Lee, Yang, and Parr was used to calculate the electronic density of the (100) Cu surface. Topological analysis of ρ(r) shows that the crystal graph corresponds to square pyramids between the atoms of the top of the surface and the atoms of the second layer The topological analysis of [Formula: see text] shows that the atomic graph of the Cu surface exhibits one (3,−3) local charge concentration surrounded by four (3,+1) local charge depletion points. Additionally, there is a (3,+3) local depletion in the midpoint between each of four contiguous Cu atoms corresponding to the active site for the adsorption of the (3,−3) local charge concentration on the C atom of the CO or the N atom of the NO molecule. The larger value of the [Formula: see text] at the nonbonded charge concentration on the atoms and the geometrical configuration of these critical points favor the interaction of the NO over the CO molecule with the (100) Cu surface. This result is in accord with the known reaction barriers for these molecules. Key words: density functional theory, Laplacian of the electronic density, (100) Cu surface, carbon monoxide, nitrogen monoxide, molecular graph, atomic graph.


2019 ◽  
Vol 21 (37) ◽  
pp. 20927-20938 ◽  
Author(s):  
Rubén Laplaza ◽  
Victor Polo ◽  
Julia Contreras-García

The accuracy of different density functional approximations is assessed through the use of quantum chemical topology on molecular electron densities.


2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Arthur France-Lanord ◽  
Ryoji Asahi ◽  
Benoît Leblanc ◽  
Joohwi Lee ◽  
Erich Wimmer

Abstract A highly efficient computational approach for the screening of Li ion conducting materials is presented and its performance is demonstrated for olivine-type oxides and thiophosphates. The approach is based on a topological analysis of the electrostatic (Coulomb) potential obtained from a single density functional theory calculation augmented by a Born-Mayer-type repulsive term between Li ions and the anions of the material. This 3D-corrugation descriptor enables the automatic determination of diffusion pathways in one, two, and three dimensions and reproduces migration barriers obtained from density functional theory calculations using nudged elastic band method within approximately 0.1 eV. Importantly, it correlates with Li ion conductivity. This approach thus offers an efficient tool for evaluating, ranking, and optimizing materials with high Li-ion conductivity.


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