A statistical simulation approach for early stage thin-film growth from vapor-deposited atoms

2007 ◽  
Vol 127 (14) ◽  
pp. 144714 ◽  
Author(s):  
Peilong Chen ◽  
T. Y. Wang ◽  
M. F. Luo
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Early Stage ◽  
Statistical Simulation ◽  
Thin Film Growth ◽  
Simulation Approach ◽  
Growth From Vapor

Computer Simulation of Early Stage in Thin-Film Growth

1999 ◽  
Vol 16 (4) ◽  
pp. 279-281 ◽  
Author(s):  
Feng-min Wu ◽  
Qiao-wen Li ◽  
Qi-peng Zhu ◽  
Zi-qin Wu
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Film Growth ◽  
Early Stage ◽  
Thin Film Growth

Influence of microstructure of substrate surface on early stage of thin film growth

Vacuum ◽  
2000 ◽  
Vol 56 (3) ◽  
pp. 185-190 ◽  
Author(s):  
Helin Wei ◽  
Zuli Liu ◽  
Kailun Yao
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Early Stage ◽  
Substrate Surface ◽  
Thin Film Growth

Effects of Plasma Cleaning and Assist on Early Stage of Ca-doped Bi2201 Thin Film Growth

2000 ◽  
pp. 960-962 ◽  
Author(s):  
Masaki Tada ◽  
Akinori Hashizume ◽  
Ken-ichi Itoh ◽  
Jiro Yamada ◽  
Hisatake Uchikawa ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Early Stage ◽  
Thin Film Growth ◽  
Plasma Cleaning

scholarly journals Early Stage of Growth of a Perylene Diimide Derivative Thin Film Growth on Various Si(001) Substrates

2007 ◽  
Vol 111 (34) ◽  
pp. 12747-12751 ◽  
Author(s):  
Matthieu Petit ◽  
Ryoma Hayakawa ◽  
Yutaka Wakayama ◽  
Toyohiro Chikyow
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Early Stage ◽  
Thin Film Growth ◽  
Perylene Diimide

Ab initioInvestigation of the Early Stage of Nano-scale Thin Film Growth: Al and Co Adatoms on Co (111) Surface

2004 ◽  
Vol 43 (6B) ◽  
pp. 3815-3817 ◽  
Author(s):  
Chiho Kim ◽  
Sang-Pil Kim ◽  
Yoon-Suk Kim ◽  
Hanchul Kim ◽  
Yong-Chae Chung
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Early Stage ◽  
Thin Film Growth ◽  
Nano Scale

“Magic” Nanostructures During the Early Stage of Thin Film Growth

2001 ◽  
Vol 672 ◽  
Author(s):  
M. Zhang ◽  
M. Yu. Efremov ◽  
F. Schiettekatte ◽  
E. A. Olson ◽  
L. H. Allen
Keyword(s):  
Thin Film ◽  
Melting Point ◽  
Film Growth ◽  
Early Stage ◽  
Thin Film Growth ◽  
Melting Point Depression ◽  
Magic Numbers ◽  
Scanning Calorimetry ◽  
Local Maxima ◽  
Cluster Beams

ABSTRACTThe behaviors of thin indium films in the early stage of growth are studied in situ by a novel ultra-sensitive thin film scanning calorimetry technique. The films consist of ensembles of self-assembled indium nanostructures whose melting temperatures are strongly influenced by size. We experimentally determine the relationship between a nanostructure's radius and its melting point by combining the measured caloric results with nanostructure size distributions obtained from TEM. The results show a linear melting point depression. Moreover, by looking at the fine structures of these caloric curves, we found the discrete nature of nanostructures during the early stage of thin film growth. The measured heat capacity values show several local maxima at certain temperatures. This suggests that preferred energy states exist among these supported nanostructures on amorphous surfaces. These local maxima are related to each other by increments of one monolayer of indium atoms. These findings could be extended from the magic numbers observed previously in cluster beams studies.

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