Influence of molecular structure and microstructure on device performance of polycrystalline pentacene thin-film transistors

2007 ◽  
Vol 90 (17) ◽  
pp. 171926 ◽  
Author(s):  
Horng-Long Cheng ◽  
Yu-Shen Mai ◽  
Wei-Yang Chou ◽  
Li-Ren Chang
2013 ◽  
Vol 1501 ◽  
Author(s):  
Ronak Rahimi ◽  
D. Korakakis

ABSTRACTIn order to manufacture organic electronic devices with high performance, more detailed studies of the structure and the morphology of the organic materials as well as the underlying physical charge transport mechanisms are warranted. For instance, high efficiency organic thin film transistors (OTFTs) require materials with high charge carrier mobility [1, 2]. The parameters that determine the charge carrier mobility of the device include the structure of the first organic layer at the organic-dielectric interface as well as the morphology and the structural order of the other organic layers. Therefore, fundamental questions about structural properties of organic materials should be answered in order to optimize device performance [2-4].In this work, several bilayer structures of LiF/PTCDI-C8 and LiF/pentacene were prepared and their morphology and molecular structure were characterized using X-ray reflectivity (XRR) technique. In order to study the effects of the films’ structures and dielectric/organic interfacial properties on the device performance, OTFTs based on these bilayers were fabricated and characterized. It has been observed that PTCDI-C8 thin films have higher molecular packing in the LiF/PTCDI-C8 bilayer structure, which results in superior electrical characteristics for OTFTs based on this organic material. Devices with LiF/PTCDI-C8 bilayer exhibit about one order of magnitude higher output current (Ids) at a constant drain-source voltage (Vds) compared to the devices with LiF/pentacene bilayer. The observed differences in the electrical characteristics of these devices can be attributed to the effects of the dielectric/organic interface and the molecular structure of the organic layers.


2012 ◽  
Vol 51 (1R) ◽  
pp. 015601 ◽  
Author(s):  
Byung Du Ahn ◽  
Hyun Soo Shin ◽  
Dong Lim Kim ◽  
Seung Min Lee ◽  
Jin-Seong Park ◽  
...  

Vacuum ◽  
2011 ◽  
Vol 85 (9) ◽  
pp. 904-907 ◽  
Author(s):  
R. Navamathavan ◽  
R. Nirmala ◽  
Cheul Ro Lee

2015 ◽  
Vol 71 (a1) ◽  
pp. s522-s522
Author(s):  
Fabiola Liscio ◽  
Laura Ferlauto ◽  
Micaela Matta ◽  
Rafael Pfattner ◽  
Mauro Murgia ◽  
...  

2011 ◽  
Vol 51 (1) ◽  
pp. 015601 ◽  
Author(s):  
Byung Du Ahn ◽  
Hyun Soo Shin ◽  
Dong Lim Kim ◽  
Seung Min Lee ◽  
Jin-Seong Park ◽  
...  

2016 ◽  
Vol 30 ◽  
pp. 237-246 ◽  
Author(s):  
Enrico Sowade ◽  
Kalyan Yoti Mitra ◽  
Eloi Ramon ◽  
Carme Martinez-Domingo ◽  
Fulvia Villani ◽  
...  

2011 ◽  
Vol 257 (22) ◽  
pp. 9386-9389 ◽  
Author(s):  
A.K. Diallo ◽  
F. Fages ◽  
F. Serein-Spirau ◽  
J.-P. Lère-porte ◽  
C. Videlot-Ackermann

2003 ◽  
Vol 762 ◽  
Author(s):  
Cheng-Ming Yu ◽  
Tiao-Yuan Huang ◽  
Tan-Fu Lei ◽  
Horng-Chih Lin

AbstractThe effects of NH3 and H2 plasma passivation on the characteristics of poly-Si thin-film transistors with source/drain extensions induced by a bottom sub-gate were studied. Our results show that significant improvements in device performance can be obtained by both passivation methods. Moreover, NH3-plasma-treatment appears to be more effective in reducing the off-state leakage, subthreshold swing, compared to H2 plasma passivation. NH3 plasma treatment is also found to be more effective in reducing the anomalous subthrehold hump phenomenon observed in non-plasma-treated short-channel devices. Detailed analysis suggests that all these improvements can be explained by the more effective passivation of the traps distributed in both the front and back sides of the channel by NH3 plasma treatment.


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