Reactive ion etching of high optical quality GaN∕sapphire photonic crystal slab using CH4–H2 chemistry

2007 ◽  
Vol 101 (4) ◽  
pp. 043103 ◽  
Author(s):  
S. Bouchoule ◽  
S. Boubanga-Tombet ◽  
L. Le Gratiet ◽  
M. Le Vassor d’Yerville ◽  
J. Torres ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Reactive Ion Etching ◽  
Optical Quality ◽  
Ion Etching ◽  
High Optical Quality ◽  
Photonic Crystal Slab

scholarly journals A Nanoscale Photonic Crystal Cavity Optomechanical System for Ultrasensitive Motion Sensing

Crystals ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 462
Author(s):  
Ji Xia ◽  
Fuyin Wang ◽  
Chunyan Cao ◽  
Zhengliang Hu ◽  
Heng Yang ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Optical Cavity ◽  
Optical Quality ◽  
Optical Force ◽  
Mechanical Oscillator ◽  
Maximum Displacement ◽  
Optomechanical System ◽  
High Optical Quality ◽  
Hybrid Platform ◽  
Optomechanical Coupling

Optomechanical nanocavities open a new hybrid platform such that the interaction between an optical cavity and mechanical oscillator can be achieved on a nanophotonic scale. Owing to attractive advantages such as ultrasmall mass, high optical quality, small mode volume and flexible mechanics, a pair of coupled photonic crystal nanobeam (PCN) cavities are utilized in this paper to establish an optomechanical nanosystem, thus enabling strong optomechanical coupling effects. In coupled PCN cavities, one nanobeam with a mass meff~3 pg works as an in-plane movable mechanical oscillator at a fundamental frequency of . The other nanobeam couples light to excite optical fundamental supermodes at and 1554.464 nm with a larger than 4 × 104. Because of the optomechanical backaction arising from an optical force, abundant optomechanical phenomena in the unresolved sideband are observed in the movable nanobeam. Moreover, benefiting from the in-plane movement of the flexible nanobeam, we achieved a maximum displacement of the movable nanobeam as 1468 . These characteristics indicate that this optomechanical nanocavity is capable of ultrasensitive motion measurements.

Three-Dimensional Photonic Crystals

2004 ◽  
Vol 99-100 ◽  
pp. 55-64 ◽  
Author(s):  
D.C. Meisel ◽  
M. Deubel ◽  
M. Hermatschweiler ◽  
K. Busch ◽  
W. Koch ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Photonic Crystals ◽  
Optical Spectroscopy ◽  
Electron Micrographs ◽  
Near Infrared ◽  
Three Dimensional ◽  
Optical Quality ◽  
Direct Laser Writing ◽  
High Optical Quality ◽  
Direct Laser

We review our work on two complementary and compatible techniques, namely direct laser writing and holographic lithography which are suitable for fabricating three-dimensional Photonic Crystal templates for the visible and near-infrared. The structures are characterized by electron micrographs and by optical spectroscopy, revealing their high optical quality.

Magnetron Reactive Ion Etching of GaAs and AIGaAs in CH4/H2/Ar Plasmas.

1996 ◽  
Author(s):  
George F. McLane ◽  
Paul Cooke ◽  
Robert P. Moerkirk
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching

Modification of the n-Surface Profile of AlGaInN LEDs by Changing the Gas-Mixture Composition During Reactive Ion Etching

2020 ◽  
Vol 54 (6) ◽  
pp. 672-676
Author(s):  
L. K. Markov ◽  
I. P. Smirnova ◽  
M. V. Kukushkin ◽  
A. S. Pavluchenko
Keyword(s):  
Reactive Ion Etching ◽  
Surface Profile ◽  
Mixture Composition ◽  
Gas Mixture ◽  
Ion Etching

Reactive ion etching of III-V compounds using C2H6/H2

1988 ◽  
Vol 24 (13) ◽  
pp. 798 ◽  
Author(s):  
T. Matsui ◽  
H. Sugimoto ◽  
T. Ohishi ◽  
H. Ogata
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching
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