Electron dynamics and harmonics emission spectra due to electron oscillation driven by intense laser pulses

2006 ◽  
Vol 13 (12) ◽  
pp. 123106 ◽  
Author(s):  
Youwei Tian ◽  
Wei Yu ◽  
Feng He ◽  
Han Xu ◽  
Vinod Senecha ◽  
...  
2020 ◽  
Vol 152 (7) ◽  
pp. 071102 ◽  
Author(s):  
Håkon Emil Kristiansen ◽  
Øyvind Sigmundson Schøyen ◽  
Simen Kvaal ◽  
Thomas Bondo Pedersen

1983 ◽  
Vol 23 ◽  
Author(s):  
B. Laurich ◽  
A. Forchel

ABSTRACTThe emission spectra of the electron-hole plasma created at the surface of a Si sample by intense laser pulses (65 ns or 400 ps) are investigated. It is shown that the plasma drift is necessary for a consistent interpretation of the luminescence line shape and the energetic position of the line. We determine average densities up to 2.1019 cm−3 for 300K and typical drift velocities up to 4.106 cm/s.


2010 ◽  
Vol 28 (1) ◽  
pp. 83-90 ◽  
Author(s):  
Q.Q. Mao ◽  
Q. Kong ◽  
Y.K. Ho ◽  
H.O. Che ◽  
H.Y. Ban ◽  
...  

AbstractThe radiative reaction effect of an electron is usually very small and can be neglected in most cases. But for an ultra intensity laser-electron interaction region, the radiation can become large. The influence of the radiative reaction effect of an electron interacting with an ultra intense laser pulses in vacuum on electron dynamics is investigated within the classical relativistic Lorentz-Dirac approach. A predictor-corrector method is proposed to numerically solve the equation of motion with the electron radiative reaction included. We study the counter-propagating case (for Thomson scattering scheme) and the same direction propagating cases (for laser acceleration). Our simulation results show that radiation can have great effect in the counter-propagating case. But in the vacuum laser electron acceleration regime, both the ponderomotive acceleration scenario case and the capture and acceleration scenario, radiative reaction effect can totally be ignored for laser intensity available presently or in the near-future.


Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.


2012 ◽  
Vol 137 (4) ◽  
pp. 044112 ◽  
Author(s):  
Mohsen Vafaee ◽  
Firoozeh Sami ◽  
Babak Shokri ◽  
Behnaz Buzari ◽  
Hassan Sabzyan

2012 ◽  
Vol 31 (1) ◽  
pp. 23-28 ◽  
Author(s):  
V.V. Korobkin ◽  
M.Yu. Romanovskiy ◽  
V.A. Trofimov ◽  
O.B. Shiryaev

AbstractA new concept of generating tight bunches of electrons accelerated to high energies is proposed. The electrons are born via ionization of a low-density neutral gas by laser radiation, and the concept is based on the electrons acceleration in traps arising within the pattern of interference of several relativistically intense laser pulses with amplitude fronts tilted relative to their phase fronts. The traps move with the speed of light and (1) collect electrons; (2) compress them to extremely high density in all dimensions, forming electron bunches; and (3) accelerate the resulting bunches to energies of at least several GeV per electron. The simulations of bunch formation employ the Newton equation with the corresponding Lorentz force.


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