scholarly journals Nanosilicon dot arrays with a bit pitch and a track pitch of 25nm formed by electron-beam drawing and reactive ion etching for 1Tbit∕in.2 storage

2006 ◽  
Vol 89 (22) ◽  
pp. 223131 ◽  
Author(s):  
Sumio Hosaka ◽  
Hirotaka Sano ◽  
Masumi Shirai ◽  
Hayato Sone
Keyword(s):  
Electron Beam ◽  
Reactive Ion Etching ◽  
Ion Etching

50−nm silicon structures fabricated with trilevel electron beam resist and reactive‐ion etching

1981 ◽  
Vol 39 (3) ◽  
pp. 268-270 ◽  
Author(s):  
L. D. Jackel ◽  
R. E. Howard ◽  
E. L. Hu ◽  
D. M. Tennant ◽  
P. Grabbe
Keyword(s):  
Electron Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Silicon Structures

Ion and electron beam deposited masks for pattern transfer by reactive ion etching

2011 ◽  
Vol 88 (8) ◽  
pp. 2710-2713 ◽  
Author(s):  
A. Notargiacomo ◽  
E. Giovine ◽  
L. Di Gaspare
Keyword(s):  
Electron Beam ◽  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Ion Etching

Electron Beam Induced Current Imaging of Silicon Oxide Damage Due to Reactive Ion Etching

1996 ◽  
Vol 51-52 ◽  
pp. 359-366
Author(s):  
Hary Kirk ◽  
Zbigniew J. Radzimski ◽  
A. Romanowski ◽  
George A. Rozgonyi
Keyword(s):  
Electron Beam ◽  
Silicon Oxide ◽  
Reactive Ion Etching ◽  
Induced Current ◽  
Ion Etching ◽  
Electron Beam Induced Current ◽  
Oxide Damage
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