Void growth during thermal decomposition of silicon oxide layers studied by low-energy electron microscopy

2006 ◽  
Vol 100 (11) ◽  
pp. 113519 ◽  
Author(s):  
H. Hibino ◽  
M. Uematsu ◽  
Y. Watanabe
Keyword(s):  
Electron Microscopy ◽  
Thermal Decomposition ◽  
Void Growth ◽  
Silicon Oxide ◽  
Low Energy ◽  
Energy Electron ◽  
Oxide Layers ◽  
Low Energy Electron

Mechanism of low temperature nitridation of silicon oxide layers by nitrogen plasma generated by low energy electron impact

1999 ◽  
Vol 85 (5) ◽  
pp. 2921-2928 ◽  
Author(s):  
Toshiko Mizokuro ◽  
Kenji Yoneda ◽  
Yoshihiro Todokoro ◽  
Hikaru Kobayashi
Keyword(s):  
Low Temperature ◽  
Electron Impact ◽  
Silicon Oxide ◽  
Nitrogen Plasma ◽  
Low Energy ◽  
Energy Electron ◽  
Oxide Layers ◽  
Low Energy Electron

Nitridation of silicon oxide layers by nitrogen plasma generated by low energy electron impact

1997 ◽  
Vol 71 (14) ◽  
pp. 1978-1980 ◽  
Author(s):  
H. Kobayashi ◽  
T. Mizokuro ◽  
Y. Nakato ◽  
K. Yoneda ◽  
Y. Todokoro
Keyword(s):  
Electron Impact ◽  
Silicon Oxide ◽  
Nitrogen Plasma ◽  
Low Energy ◽  
Energy Electron ◽  
Oxide Layers ◽  
Low Energy Electron

The potential of the scanning low energy electron microscopy for the examination of aluminum based alloys and composites

Microscopy ◽  
2005 ◽  
Vol 54 (2) ◽  
pp. 109-117 ◽  
Author(s):  
Kenji Matsuda ◽  
Susumu Ikeno ◽  
Ilona Müllerová ◽  
Luděk Frank
Keyword(s):  
Electron Microscopy ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

Spin Polarized Low Energy Electron Microscopy (Spleem) of Single and Combined Layers of Co, Cu, and Pd on W (110)

1993 ◽  
Vol 313 ◽  
Author(s):  
Helmut Poppa ◽  
Heiko Pinkvos ◽  
Karsten Wurm ◽  
Ernst Bauer
Keyword(s):  
Electron Microscopy ◽  
Band Structure ◽  
Film Growth ◽  
Magnetic Domain ◽  
Low Energy ◽  
Energy Electron ◽  
Magnetic Studies ◽  
Deposition Rates ◽  
Spin Polarized ◽  
Low Energy Electron

ABSTRACTIn-situ recording of ultra-thin film growth by Low Energy Electron Microscopy (LEEM) results in accurate determinations of monolayer metal deposition rates for difficult to calibrate deposition geometries. Deposition rates and growth features were determined for Cu and Co on W (110) allowing for thickness control at the submonolayer level. Also, the transparencies of non-Magnetic overlayers of Pd (111) and Cu (111) to very low energy spin polarized electrons were compared and qualitatively explained by band structure considerations. Cu (111) is much more transparent than Pd (111) so that magnetic domain structures can be observed through at least 4 nmof Cu (111). This suggests the use of Cu (111) and other metals of suitable band structure as protective layers for surface magnetic studies.

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