scholarly journals Comoving acceleration of overdense electron-positron plasma by colliding ultra-intense laser pulses

2006 ◽  
Vol 13 (6) ◽  
pp. 064506 ◽  
Author(s):  
Edison Liang
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Electron Positron

Electron-Positron Plasmas Created by Ultra-Intense Laser Pulses Interacting with Solid Targets

2005 ◽  
Vol 298 (1-2) ◽  
pp. 347-355 ◽  
Author(s):  
S. C. Wilks ◽  
H. Chen ◽  
E. Liang ◽  
P. Patel ◽  
D. Price ◽  
...  
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Electron Positron

Electron-Positron Plasmas Created By Ultra-Intense Laser Pulses Interacting With Solid Targets

2005 ◽  
pp. 347-355
Author(s):  
S.C. Wilks ◽  
H. Chen ◽  
E. Liang ◽  
P. Patel ◽  
D. Price ◽  
...  
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Electron Positron

Production of electron–positron pairs by intense laser pulses in an overdense plasma

2007 ◽  
Vol 360 (4-5) ◽  
pp. 624-628 ◽  
Author(s):  
V.I. Berezhiani ◽  
D.P. Garuchava ◽  
P.K. Shukla
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Electron Positron ◽  
Overdense Plasma

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

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