Anomalous positive exchange bias in Ni80Fe20∕NixFe1−xO thin-film bilayers induced by ion-beam deposition effects

2006 ◽  
Vol 99 (8) ◽  
pp. 08C104 ◽  
Author(s):  
J. van Lierop ◽  
K.-W. Lin ◽  
H. Ouyang ◽  
Y.-M. Tzeng ◽  
Z.-Y. Guo
Keyword(s):  
Thin Film ◽  
Exchange Bias ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Beam Deposition

Exchange bias of MnPt/CoFe films prepared by ion beam deposition

2004 ◽  
Vol 95 (11) ◽  
pp. 6317-6321 ◽  
Author(s):  
M. Rickart ◽  
P. P. Freitas ◽  
I. G. Trindade ◽  
N. P. Barradas ◽  
E. Alves ◽  
...  
Keyword(s):  
Exchange Bias ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Beam Deposition

Combined ion beam deposition and etching for thin film studies

1979 ◽  
Vol 16 (6) ◽  
pp. 1901-1905 ◽  
Author(s):  
J. M. E. Harper ◽  
R. J. Gambino
Keyword(s):  
Thin Film ◽  
Film Studies ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Beam Deposition

Ion beam deposition of carbon overcoats for magnetic thin film media

2000 ◽  
Vol 36 (1) ◽  
pp. 120-124 ◽  
Author(s):  
K.J. Grannen ◽  
Xiaoding Ma ◽  
R. Thangaraj ◽  
Jing Gui ◽  
G.C. Rauch
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Magnetic Thin Film ◽  
Ion Beam Deposition ◽  
Carbon Overcoats ◽  
Beam Deposition

Ion Beam Deposition for Novel Thin Film Materials and Coatings

2011 ◽  
Vol 674 ◽  
pp. 195-200 ◽  
Author(s):  
A.Y. Goikhman ◽  
S.A. Sheludyakov ◽  
E. A. Bogdanov
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Ion Beam ◽  
High Vacuum ◽  
Growth Conditions ◽  
High Energy ◽  
Present Contribution ◽  
Ion Beam Deposition ◽  
Thin Film Preparation ◽  
Beam Deposition

The Ion Beam Deposition (IBD) technique is not very widespread, but simple and very powerful methodic of thin film preparation, allowing to obtain high quality, smooth and very uniform films on big substrate areas (until 40 cm diameter), by target ablation with high energy particles in high vacuum. For the bombarding of the target is convenient to use the charged particles – ions of Ar, because they are easy to disperse in the electric field. Also, including neutralizing system, allow to obtain high-energy neutrals, irradiating the target, producing thin films from any kind of solid targets: from simple metals to complex conducting and non-conducting stoichiometric alloys. Thus, energy of condensing target particles is an average from several units to tens of eV. In the present contribution, we discuss the possibilities and advantages of IBD technology on application examples, including results of functional properties research of Ti, TiO2, SiO2 and Ag thin films for medicine applications, Ni, NiOx, Co and CoO single layers and structures for spintronics applications, and TiO2-SiO2, Ti-Zr-O-SiO2 multilayer structures for laser mirrors applications, produced by IBD system. Good structural, morphological quality (with roughness ~ 0.3 nm) and high uniformity on big areas along with right phase and stoichiometric state is demonstrated by convenient standard techniques for the structures prepared under the optimized growth conditions.

Thin film processing by biased target ion beam deposition

2000 ◽  
Vol 36 (5) ◽  
pp. 2966-2971 ◽  
Author(s):  
T.L. Hylton ◽  
B. Ciorneiu ◽  
D.A. Baldwin ◽  
O. Escorcia ◽  
J. Son ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Film Processing ◽  
Beam Deposition ◽  
Thin Film Processing
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