Structure and trapping of three-dimensional dust clouds in a capacitively coupled rf-discharge

2005 ◽  
Author(s):  
O. Arp
Keyword(s):  
Three Dimensional ◽  
Rf Discharge ◽  
Capacitively Coupled ◽  
Dust Clouds

scholarly journals Diagnostics of low-pressure capacitively coupled RF discharge argon plasma

2019 ◽  
Vol 13 (27) ◽  
pp. 76-82
Author(s):  
Kadhim A. Aadim
Keyword(s):  
Electron Temperature ◽  
Electron Density ◽  
Langmuir Probe ◽  
Gas Flow ◽  
Low Pressure ◽  
Gas Pressure ◽  
Rf Discharge ◽  
Electrode Gap ◽  
Probe Characteristic ◽  
Capacitively Coupled

Low-pressure capacitively coupled RF discharge Ar plasma has been studied using Langmuir probe. The electron temperature, electron density and Debay length were calculated under different pressures and electrode gap. In this work the RF Langmuir probe is designed using 4MHz filter as compensation circuit and I-V probe characteristic have been investigated. The pressure varied from 0.07 mbar to 0.1 mbar while electrode gap varied from 2-5 cm. The plasma was generated using power supply at 4MHz frequency with power 300 W. The flowmeter is used to control Argon gas flow in the range of 600 standard cubic centimeters per minute (sccm). The electron temperature drops slowly with pressure and it's gradually decreased when expanding the electrode gap. As the gas pressure increases, the plasma density rises slightly at low gas pressure while it drops little at higher gas pressure. The electron density decreases rapidly with expand distances between electrodes.

Photo-Oxidation of Hydrogenated Amorphous Silicon-Carbon Alloys

1989 ◽  
Vol 158 ◽  
Author(s):  
P. John ◽  
I.M. Odeh ◽  
A. Qayyum ◽  
J.I.B. Wilson
Keyword(s):  
Amorphous Silicon ◽  
Photoelectron Spectroscopy ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Rf Discharge ◽  
Silicon Substrates ◽  
Capacitively Coupled ◽  
X Ray ◽  
Silicon Carbon ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon-carbon alloys, a-Si:C:H, have been deposited as thin films (d=0.1-0.5 micron) on crystalline silicon substrates from a capacitively coupled rf discharge in silane-propane mixtures. Variations in the stoichiometry of the films were achieved by altering the ratio of SiH4 to C3H8 flow rates at a sbstrate temperature in the range 240-260°C and total pressure between 30-70 mtorr. The silicon to carbon ratios were established by X-ray photoelectron spectroscopy, XPS, and the hydrogen content and distribution by infra-red spectroscopy.

Diffusion Dynamics of Charged Dust Particles in Capacitively Coupled RF Discharge System

2011 ◽  
Author(s):  
W. X. Chew ◽  
S. V. Muniandy ◽  
C. S. Wong ◽  
S. L. Yap ◽  
K. S. Tan
Keyword(s):  
Dust Particles ◽  
Rf Discharge ◽  
Charged Dust ◽  
Discharge System ◽  
Capacitively Coupled ◽  
Diffusion Dynamics

Anti-Adhesive Finishing of Temporary Implant Surfaces by a Plasma-Fluorocarbon-Polymer

2014 ◽  
Vol 783-786 ◽  
pp. 1238-1243 ◽  
Author(s):  
Birgit Finke ◽  
Holger Testrich ◽  
Henrike Rebl ◽  
Barbara Nebe ◽  
Rainer Bader ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Trauma Surgery ◽  
Titanium Implant ◽  
Tissue Response ◽  
Rf Discharge ◽  
Water Contact ◽  
Capacitively Coupled ◽  
Fluorocarbon Polymer ◽  
Tissue Reactions

Titanium implant surfaces should ideally be designed to support the subsequent clinical application. Therefore temporarily used implants have to fulfill both the mechanical stabilization of the bone stock and furthermore in trauma surgery the disintegration into the bone because the implant should be removed after fracture healing. The anti-adhesive plasma-fluorocarbon-polymer (PFP) films were synthesized using two different low-pressure plasma sources, the 2.45 GHz microwave (mw) and the 13.56 MHz capacitively coupled radio-frequency (rf) discharge in a mixture of the precursor octafluoropropane (C3F8) and hydrogen (H2). The film properties were characterized using X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, water contact angle measurements, and abrasive strength tests. Cell adhesion and spreading of human osteoblasts were clearly reduced on these PFP surfaces. First in vivo data on the biocompatibility of the PFP films deposited in the rf-discharge demonstrate that the local inflammatory tissue response for PFP coating was comparable to controls, while a PFP coating deposited in mw plasma induced stronger tissue reactions.

Three-dimensional model of magnetized capacitively coupled plasmas

2009 ◽  
Vol 105 (10) ◽  
pp. 103301 ◽  
Author(s):  
Shahid Rauf ◽  
Jason Kenney ◽  
Ken Collins
Keyword(s):  
Three Dimensional ◽  
Dimensional Model ◽  
Three Dimensional Model ◽  
Capacitively Coupled ◽  
Coupled Plasmas

scholarly journals Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 999
Author(s):  
Ho Jun Kim
Keyword(s):  
Deposition Rate ◽  
Complex Geometry ◽  
Plasma Reactor ◽  
Three Dimensional ◽  
Multiple Roles ◽  
Capacitively Coupled ◽  
Large Particles ◽  
Capacitively Coupled Plasma ◽  
Physical Phenomena ◽  
Number Of Particles

Increasing the productivity of a showerhead-type capacitively coupled plasma (CCP) reactor requires an in-depth understanding of various physical phenomena related to the showerhead, which is not only responsible for gas distribution, but also acts as the electrode. Thus, we investigated how to enhance the cleanliness and deposition rate by studying the multiple roles of the showerhead electrode in a CCP reactor. We analyzed the gas transport in a three-dimensional complex geometry, and the SiH4/He discharges were simulated in a two-dimensional simplified geometry. The process volume was installed between the showerhead electrode (radio frequency powered) and the heater electrode (grounded). Our aim of research was to determine the extent to which the heated showerhead contributed to increasing the deposition rate and to reducing the size of the large particles generated during processing. The temperature of the showerhead was increased to experimentally measure the number of particles transported onto the heater to demonstrate the effects thereof on the decrease in contamination. The number of particles larger than 45 nm decreased by approximately 93% when the showerhead temperature increased from 373 to 553 K.

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