Self-fabrication of void array in fused silica by femtosecond laser processing

2005 ◽  
Vol 87 (17) ◽  
pp. 171103 ◽  
Author(s):  
Eiji Toratani ◽  
Masanao Kamata ◽  
Minoru Obara
Keyword(s):  
Femtosecond Laser ◽  
Laser Processing ◽  
Fused Silica ◽  
Femtosecond Laser Processing

Femtosecond Laser Processing of Glass Materials for Assembly-Free Fabrication of Photonic Microsensors

2014 ◽  
Vol 90 ◽  
pp. 166-173 ◽  
Author(s):  
Lei Yuan ◽  
Xin Wei Lan ◽  
Jie Huang ◽  
Hai Xiao
Keyword(s):  
Femtosecond Laser ◽  
Laser Processing ◽  
Photonic Devices ◽  
Fused Silica ◽  
Femtosecond Laser Processing ◽  
Industry Applications ◽  
One Step ◽  
Photonic Sensors

Research and development in photonic micro/nanodevices and structures have experienced a significant growth in recent years, fueled by their broad applications as sensors for in situ measurement of a wide variety of physical, chemical and biological quantities. Recent advancement in ultrafast and ultra-intense pulsed laser technology has opened a new window of opportunity for one-step fabrication of micro-and even nanoscale 3D structures in various solid materials. When used for fabrication, fs lasers have many unique advantages such as negligible cracks, minimal heat-affected-zone, low recast, and high precision. These advantages enable the unique opportunity to fabricate integrated sensors with unprecedented performance, enhanced functionalities and improved robustness. This paper summarizes our recent research progresses in the understanding, design, fabrication, characterization of various photonic sensors for energy, defense, environmental, biomedical and industry applications. Femtosecond laser processing/ablation of various glass materials (fused silica, doped silica, sapphire, etc.) is discussed towards the goal of one-step fabrication of novel photonic sensors and new enabling photonic devices. A number of new photonic devices and sensors are also presented.

Study on ablation threshold of fused silica by liquid-assisted femtosecond laser processing

2019 ◽  
Vol 58 (33) ◽  
pp. 9027
Author(s):  
Xiaoyan Sun ◽  
Jinlong Yu ◽  
Youwang Hu ◽  
Dongmei Cui ◽  
Guowei Chen ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Laser Processing ◽  
Ablation Threshold ◽  
Fused Silica ◽  
Femtosecond Laser Processing

Improving the quality of femtosecond laser processing micro-hole array by coated with aluminum film on fused silica sheet

Optik ◽  
2017 ◽  
Vol 128 ◽  
pp. 178-184 ◽  
Author(s):  
Zhuping Wang ◽  
Guoying Feng ◽  
Shutong Wang ◽  
Guang Li ◽  
Shenyu Dai ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Laser Processing ◽  
Aluminum Film ◽  
Fused Silica ◽  
Hole Array ◽  
Femtosecond Laser Processing ◽  
Micro Hole

Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass

2017 ◽  
Vol 15 (7) ◽  
pp. 071403 ◽  
Author(s):  
Dongkai Chu Dongkai Chu ◽  
Xiaoyan Sun Xiaoyan Sun ◽  
Youwang Hu Youwang Hu ◽  
Xinran Dong Xinran Dong ◽  
Kai Yin Kai Yin ◽  
...  
Keyword(s):  
High Temperature ◽  
Femtosecond Laser ◽  
Silica Glass ◽  
Laser Processing ◽  
Fused Silica ◽  
Micro Channel ◽  
Femtosecond Laser Processing ◽  
Temperature Lattice ◽  
Fused Silica Glass

A Prediction Model for Ablation Fluence Threshold in Femtosecond Laser Processing of Fused Silica

2017 ◽  
Vol 5 (3) ◽  
Author(s):  
Han Wang ◽  
Hong Shen
Keyword(s):  
Femtosecond Laser ◽  
Laser Processing ◽  
Three Dimensional ◽  
Ionization Rate ◽  
Fused Silica ◽  
Published Data ◽  
Direct Writing ◽  
Femtosecond Laser Processing ◽  
Ideal Tool ◽  
Improved Model

The manufacture of micro–nano structures in transparent dielectrics is becoming increasingly important due to the applications in medical and biological sciences. The femtosecond pulsed laser, with its selectivity, high precision, and three-dimensional direct writing nature, is an ideal tool for this processing technology. In this paper, an improved model for the prediction of ablation crater shape and fluence threshold in femtosecond laser processing of fused silica is presented, in which self-trapping excitons and electrons' relaxation are involved to depict ionization process, Thornber's and Keldysh's models are employed to estimate ionization rate precisely, and a novel ablation criterion is proposed to judge ablation. Moreover, the relationship between the ablation fluence threshold and laser pulse duration is investigated with three different extrapolation methods. The results indicate that no matter which extrapolation method is employed, the ablation fluence thresholds predicted by the presented model agree with the published data.

Femtosecond laser processing of fused silica and aluminum based on electron dynamics control by shaping pulse trains

2012 ◽  
Vol 109 (3) ◽  
pp. 679-684 ◽  
Author(s):  
Ni Leng ◽  
Lan Jiang ◽  
Xin Li ◽  
Chuancai Xu ◽  
Pengjun Liu ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Laser Processing ◽  
Fused Silica ◽  
Electron Dynamics ◽  
Pulse Trains ◽  
Femtosecond Laser Processing
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