A New NIST Database for the Simulation of Electron Spectra for Surface Analysis (SESSA): Application to Angle-Resolved X-ray Photoelectron Spectroscopy of HfO2, ZrO2, HfSiO4, and ZrSiO4 Films on Silicon
Keyword(s):
X Ray
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2005 ◽
Vol 37
(11)
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pp. 1059-1067
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2007 ◽
Vol 111
(40)
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pp. 11850-11857
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2017 ◽
Vol 3
(6)
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pp. 882-889
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1986 ◽
Vol 27
(1)
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pp. 93-105
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