Hybrid-phase growth in microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition at low temperatures

T. Sugano; T. Kitagawa; Y. Sobajima; T. Toyama; H. Okamoto

doi:10.1063/1.1883720

Hybrid-phase growth in microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition at low temperatures

Journal of Applied Physics ◽

10.1063/1.1883720 ◽

2005 ◽

Vol 97 (9) ◽

pp. 094910 ◽

Cited By ~ 16

Author(s):

T. Sugano ◽

T. Kitagawa ◽

Y. Sobajima ◽

T. Toyama ◽

H. Okamoto

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Phase Growth ◽

Microcrystalline Silicon ◽

Silicon Thin Films

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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.07.134 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 102-106 ◽

Cited By ~ 9

Author(s):

T. Daimaru ◽

A. Tabata ◽

T. Mizutani

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gas Flow ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Flow Rates ◽

Silicon Thin Films ◽

Gas Pressures

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Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00757-9 ◽

2000 ◽

Vol 360 (1-2) ◽

pp. 205-212 ◽

Cited By ~ 15

Author(s):

M. Zhu ◽

X. Guo ◽

G. Chen ◽

H. Han ◽

M. He ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Silicon Thin Films

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Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2012.02.008 ◽

2012 ◽

Vol 15 (4) ◽

pp. 412-420 ◽

Cited By ~ 9

Author(s):

Limin Qi ◽

Zhijuan Hu ◽

Wang Li ◽

Xiaomei Qin ◽

Guoping Du ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Influence Of Substrate

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Diffusion length measurements of microcrystalline silicon thin films prepared by hot-wire/catalytic chemical vapor deposition (HWCVD)

Thin Solid Films ◽

10.1016/j.tsf.2005.07.141 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 137-140 ◽

Cited By ~ 8

Author(s):

S. Okur ◽

M. Güneş ◽

F. Finger ◽

R. Carius

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diffusion Length ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Catalytic Chemical Vapor Deposition ◽

Silicon Thin Films ◽

Length Measurements

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Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/49/28/285203 ◽

2016 ◽

Vol 49 (28) ◽

pp. 285203 ◽

Cited By ~ 4

Author(s):

Junkang Wang ◽

Pavel Bulkin ◽

Ileana Florea ◽

Jean-Luc Maurice ◽

Erik Johnson

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Resonance Plasma

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Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

Thin Solid Films ◽

10.1016/j.tsf.2007.12.060 ◽

2008 ◽

Vol 516 (20) ◽

pp. 6912-6918 ◽

Cited By ~ 16

Author(s):

X.D. Zhang ◽

F.R. Zhang ◽

E. Amanatides ◽

D. Mataras ◽

Y. Zhao

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Substrate Bias ◽

Microcrystalline Silicon ◽

Silicon Thin Films

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Comparative studies of structural and electrical properties of doped microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

2008 33rd IEEE Photovolatic Specialists Conference ◽

10.1109/pvsc.2008.4922565 ◽

2008 ◽

Author(s):

P. Kumar ◽

B. Schroeder

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Comparative Studies ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Structural And Electrical Properties

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Optimized hydrogen concentration within a remotely induced hollow-anode plasma for fast chemical-vapor-deposition of photosensitive and -preferential microcrystalline silicon thin-films

Thin Solid Films ◽

10.1016/j.tsf.2019.137714 ◽

2020 ◽

Vol 694 ◽

pp. 137714

Author(s):

Toshihiro Tabuchi ◽

Yasumasa Toyoshima ◽

Shinichi Fujimoto ◽

Masayuki Takashiri

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Hydrogen Concentration ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Hollow Anode ◽

Anode Plasma ◽

Fast Chemical

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Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.07.140 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 133-136 ◽

Cited By ~ 5

Author(s):

Jean-Eric Bourée ◽

Sandesh R. Jadkar ◽

Samir Kasouit ◽

Régis Vanderhaghen

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Silicon Thin Films

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Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

Thin Solid Films ◽

10.1016/j.tsf.2011.08.110 ◽

2012 ◽

Vol 520 (11) ◽

pp. 3999-4002 ◽

Cited By ~ 3

Author(s):

C.C. Du ◽

T.C. Wei ◽

C.H. Chang ◽

S.L. Lee ◽

M.W. Liang ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Control Tool

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